In order to ensure proper SASE lasing of a fourth Generation light source, one of the goal is to produce an electron beam of small emittance and to conserve it until its used in the machine undulator. One of the non recoverable emittance increase is
the collision of the electron beam during its transport with the residual gas. Based on previous work by others, we have derived a useful expression of emittance increase for electrons of any energy and cross check its validity for energies above 100 MeV with an analytical formula.
Dependence of the secondary electron yield (SEY) from the primary beam incident energy and the coverage has been measured for neon, argon, krypton and xenon condensed on a target at 4.2K. The beam energy ranged between 100 eV and 3 keV, the maximal a
pplied coverage have made up 12000, 4700, 2500 and 1400 monolayers correspondingly for neon, argon, krypton and xenon. The SEY results for these coverages can be considered as belonging only to investigated gases without influence of the target material. The SEY dependencies versus the primary beam energy for all gases comprise only an ascending part and therefore, the maximal measured SEY values have been obtained for the beam energy of 3keV and have made up 62, 73, 60.5 and 52 for neon, argon, krypton and xenon correspondingly. Values of the first cross-over have made up 21 eV for neon, 14 eV for argon, 12.5 eV for krypton and 10.5 eV for xenon. An internal field appearing across a film due to the beam impact can considerably affect the SEY measurements that demanded the beam current to be reduced till 9.0E-10A. Duration of the beam impact varied between 500 mu sec and 250 mu sec. It was found that reliable SEY measurements can also be taken on a charged surface if the charge was acquired due to beam impact with electrons of higher energy. All SEY measurements for once applied coverage have been carried out for whole range of incident energies from 3 keV down to 100 eV without renewing the film. Developing of pores inside of a deposited film can significantly increase the SEY as it was observed during warming up the target.
Charging up the surface of an insulator after beam impact can lead either to reverse sign of field between the surface and collector of electrons for case of thick sample or appearance of very high internal field for thin films. Both situations disca
rd correct measurements of secondary electron emission (SEE) and can be avoided via reducing the beam dose. The single pulse method with pulse duration of order of tens microseconds has been used. The beam pulsing was carried out by means of an analog switch introduced in deflection plate circuit which toggles its output between beam on and beam off voltages depending on level of a digital pulse. The error in measuring the beam current for insulators with high value of SEE was significantly reduced due to the use for this purpose a titanium sample having low value of the SEE with DC method applied. Results obtained for some not coated insulators show considerable increase of the SEE after baking out at 3500C what could be explained by the change of work function. Titanium coatings on alumina exhibit results close to the ones for pure titanium and could be considered as an effective antimultipactor coating.
A compact X-ray Free Electron Laser (SwissFEL) is under development at the Paul Scherrer Institute. To increase facility efficiency the main linac will operate in two electron bunch mode. The two bunches are separated in time by 28 ns and sent to two
undulator lines. The combination of two beam lines should produce short X-ray pulses covering wavelength range from 1 to 70 {AA} with submicron position stability. To separate the two bunches, a novel electron beam switching system is being developed. The total deflection is achieved with a combination of high Q-factor resonant deflector magnet, followed by a DC septum magnet. The shot-to-shot deflection stability of the entire switching system should be <+/-10 ppm in amplitude and +/-100 ps in time, values which present severe measurement difficulties. Deflection magnets requirements, development and results of the kicker prototype are presented.
Activation of the surroundings of an accelerator must be quantified and those data provided to the official agencies. This is a necessary step in obtaining the authorization to operate such an accelerator. SwissFEL, being a fourth generation light so
urce, will produce more accelerated charges, which are dumped or lost, than conventional third generation light source, such as the Swiss Light Source. We have simulated the propagation of a dark current beam produced in the photoelectron gun using tracking codes like ASTRA and Elegant for the current layout of SwissFEL. Experimental studies have been carried out at the SwissFEL test facilities at PSI (C-Band RF Stand and SwissFEL Injector Test Facility), in order to provide necessary input data for detailed study of components (RF gun and C-band RF structures) using the simulation code OPAL. A summary of these studies are presented.
Quantum efficiency studies for various wavelength and various technical metal surfaces were carried out in a dedicated unbaked vacuum chamber. Copper, magnesium, aluminium and aluminium-lithium photocathodes were irradiated by two different high powe
r, high repetition rate, laser systems. We have observed an emission of electrons for photon energy below the work function of the material. This is explained by multiple photon absorption at the photocathode. We have not observed any degradation of the QE for those materials, but an improvement when irradiating them over a long period of time. This is contrary to observations made in RF photoguns.
Field Emitting Arrays (FEAs) are a promising alternative to the conventional cathodes in different vacuum electronic devices such as traveling wave tubes, electron accelerators and etc. Electrical gating and modulation capabilities, together with the
ability to produce stable and homogeneous electron beam in high electric field environment are the key requirements for their practical application. Due to relatively high gate capacitance, fast controlling of FEA emission is difficult. In order to achieve sub-nanosecond, electrically controlled, FEA based electron emission a special pulsed gate driver was developed. Bipolar high voltage (HV)pulses are used to rapidly inject and remove charge form FEA gate electrode controlling quickly electron extraction gate voltage. Short electron emission pulses (<600 ps FWHM) were observed in low and high gradient (up to 12 MV/m) environment. First attempts were made to combine FEA based electron emission with radio frequency acceleration structures (1.5 GHz) using pulsed preacceleration. The gate driver design together with low inductance FEA chip contact system is described. The results obtained in low and high gradient experimental setups are presented and discussed.
The application of a high electrical field on metallic surfaces leads to the well described phenomena of breakdown. In the classical scenario, explosive electron emission (EEE), breakdown (BD) originates from an emitting site (surface protrusion). Th
e conditioning process consists of burning the emitting sites one after another and numerous observations exhibit surfaces covered with molten craters that more or less overlap. When dealing with RF cavities for accelerators, where increasingly fields are now sought, one can legitimately wonder if other physical phenomena should also be taken into account. In particular, we believe that electromigration, especially at surfaces or grain boundaries cannot be neglected anymore at high field (i.e. 50-100 MV/m). Many publications in the domain of liquid metal emission sources show that very stable and strong emission sources, either ions or electrons, build up on metallic surfaces submitted to electrical fields through a mechanism that is slightly different from the usual localized breakdown evoked in accelerators. This mechanism involves the combination of electromigration and collective motion of surface atoms. The recent results obtained on 30 GHz CLIC (Compact Linear Collider) accelerating structures, altogether with the data exposed hereafter have led us to propose a complementary scenario (pre-plasma apparition), based on electromigration, which could explain early melting of large areas of the surface.
For the Low Emittance Gun (LEG) project at Paul Scherrer Institute a stable and reliable high voltage pulsed generator was needed in order to study low emittance beams generation and transport. The system had to provide variable asymmetric voltage pu
lse up to -500 kV with amplitude stability better than 1.2 part per thousand (ppt). The pulse should be applied to the cathode of variable gap accelerating diode providing voltage gradients up to more than 100 MV/m. A broad bandwidth electrical connection to the cathode is necessary in order to deliver fast cathode gating signal. The design of the pulser is presented as well as the optimization and implementation of some critical components in the system. A detailed electrical model of the pulsed generator was created in order to optimize and study its electrical behavior. The measured waveforms are compared to the simulated ones and output amplitude stability is discussed. Different electrode materials and surface treatments were studied to ensure breakdown free operation of the gun at high electrical gradients. Diamond Like Carbon (DLC) coating has shown excellent vacuum gap insulation capabilities reaching surface breakdown electric field of more than 250 MV/m. The designed high voltage system showed very good stability and reliability and it was a useful tool for many cathode and electron beam studies.
For the SwissFEL Free Electron Laser project at the Paul Scherrer Institute, a pulsed High Gradient (HG) electron gun was used to study low emittance electron sources. Different metals and surface treatments for the cathode and anode were studied for
their HG suitability. Diamond Like Carbon (DLC) coatings are found to perform exceptionally well for vacuum gap insulation. A set of DLC coated electrodes with different coating parameters were tested for both vacuum breakdown and photo electron emission. Surface electric fields over 250MV/m (350 - 400kV, pulsed) were achieved without breakdown. From the same surface, it was possible to photo-emit an electron beam at gradients up to 150MV/m. The test setup and the experimental results are presented
