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Electrical properties of SmB$_6$ thin films prepared by pulsed laser deposition from a stoichiometric SmB$_6$ target

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 Added by Marianna Batkova
 Publication date 2020
  fields Physics
and research's language is English




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Possible existence of topologically protected surface in samarium hexaboride has created a strong need for investigations allowing to distinguish between properties coming from the surface states and those originating in the (remaining) bulk. Studies of SmB6 thin films represent a favorable approach allowing well defined variations of the bulk volume that is not affected by surface states. Moreover, thin films are highly desirable for potential technology applications. However, the growth of SmB6 thin films is accompanied by technology problems, which are typically associated with maintaining the correct stoichiometry of samarium and boron. Here we present feasibility study of SmB6 thin film synthesis by pulsed laser deposition (PLD) from a single stoichiometric SmB6 target. As proved by Rutherford Backscattering Spectrometry (RBS), we succeeded to obtain the same ratio of samarium and boron in the films as that in the target. Thin films revealing characteristic electrical properties of (crystalline) SmB6 were successfully deposited on MgO, sapphire, and glass-ceramics substrates, when the substrates were kept at temperature of 600$^circ$ C during the deposition. Performed electrical resistance studies have revealed that bulk properties of the films are only slightly affected by the substrate. Our results indicate that PLD is a suitable method for complex and intensive research of SmB6 and similar systems.

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We show that the resistivity plateau of SmB$_6$ at low temperature, typically taken as a hallmark of its conducting surface state, can systematically be influenced by different surface treatments. We investigate the effect of inflicting an increasing number of hand-made scratches and microscopically defined focused ion beam-cut trenches on the surfaces of flux-grown Sm$_{1-x}$Gd$_x$B$_6$ with $x =$ 0, 0.0002. Both treatments increase the resistance of the low-temperature plateau, whereas the bulk resistance at higher temperature largely remains unaffected. Notably, the temperature at which the resistance deviates from the thermally activated behavior decreases with cumulative surface damage. These features are more pronounced for the focused ion beam treated samples, with the difference likely being related to the absence of microscopic defects like subsurface cracks. Therefore, our method presents a systematic way of controlling the surface conductance.
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