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Register a new userStructural, electrical and magnetic studies of Co:SnO2 and (Co,Mo):SnO2 films prepared by pulsed laser deposition
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Here we report on the structural, optical, electrical and magnetic properties of Co-doped and (Co,Mo)-codoped SnO2 thin films deposited on r-cut sapphire substrates by pulsed laser deposition. Substrate temperature during deposition was kept at 500 C. X-ray diffraction analysis showed that the undoped and doped films are crystalline with predominant orientation along the [101] direction regardless of the doping concentration and doping element. Optical studies revealed that the presence of Mo reverts the blue shift trend observed for the Co-doped films. For the Co and Mo doping concentrations studied, the incorporation of Mo did not contribute to increase the conductivity of the films or to enhance the ferromagnetic order of the Co-doped films.
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Possible existence of topologically protected surface in samarium hexaboride has created a strong need for investigations allowing to distinguish between properties coming from the surface states and those originating in the (remaining) bulk. Studies of SmB6 thin films represent a favorable approach allowing well defined variations of the bulk volume that is not affected by surface states. Moreover, thin films are highly desirable for potential technology applications. However, the growth of SmB6 thin films is accompanied by technology problems, which are typically associated with maintaining the correct stoichiometry of samarium and boron. Here we present feasibility study of SmB6 thin film synthesis by pulsed laser deposition (PLD) from a single stoichiometric SmB6 target. As proved by Rutherford Backscattering Spectrometry (RBS), we succeeded to obtain the same ratio of samarium and boron in the films as that in the target. Thin films revealing characteristic electrical properties of (crystalline) SmB6 were successfully deposited on MgO, sapphire, and glass-ceramics substrates, when the substrates were kept at temperature of 600$^circ$ C during the deposition. Performed electrical resistance studies have revealed that bulk properties of the films are only slightly affected by the substrate. Our results indicate that PLD is a suitable method for complex and intensive research of SmB6 and similar systems.
The preparation in thin film form of the known icosahedral phase in Ti-Ni-Zr bulk alloys has been investigated as a function of substrate temperature. Films were deposited by Pulsed Laser Deposition on sapphire substrates at temperatures ranging from room temperature to 350$^circ$C. Morphological and structural modifications have been followed by grazing incidence and $theta$-2$theta$ X-ray diffraction, transmission electron diffraction and imaging. Chemical composition has been analysed by Electron Probe Micro-Analysis. The in-depth variation of composition has been studied by Secondary Neutral Mass Spectroscopy. We show that Pulsed Laser Deposition at 275$^circ$C makes the formation of a 1 m thick film of Ti-Ni-Zr quasicrystalline textured nanocrystallites possible.
In the present study we report on properties of ZnCoO films grown at relatively low temperature by the Atomic Layer Deposition, using two reactive organic zinc precursors (dimethylzinc and diethylzinc). The use of these precursors allowed us the significant reduction of a growth temperature to below 300oC. The influence of growth conditions on the Co distribution in ZnCoO films, their structure and magnetic properties was investigated using Secondary Ion Mass Spectroscopy, Scanning Electron Microscopy, Cathodoluminescence, Energy Dispersive X-ray Spectrometry (EDX), X-ray diffraction and Superconducting Quantum Interference Device magnetometry. We achieved high uniformity of the films grown at 160{deg}C. Such films are paramagnetic. Films grown at 200{deg} and at higher temperature are nonuniform. Formation of foreign phases in such films was detected using high resolution EDX method. These samples are not purely paramagnetic and show weak ferromagnetic response at low temperature.
Cu2Ta4O12 (CTaO) thin films were successfully deposited on Si(100) substrates by pulsed-laser deposition technique. The crystalline structure and the surface morphology of the CTaO thin films were strongly affected by substrate temperature, oxygen pressure and target - substrate distance. In general during deposition of CTaO the formation of a Ta2O5 phase appeared, on which CTaO grew with different orientations. We report on the experimental set-up, details for film deposition and the film properties determined by SEM, EDX and XRD.
Micron-thick boron films have been deposited by Pulsed Laser Deposition in vacuum on several substrates at room temperature. The use of high energy pulses (>700 mJ) results in the deposition of smooth coatings with low oxygen uptake even at base pressures of 10$^{-4}$ - 10$^{-3}$ Pa. A detailed structural analysis, by X-Ray Diffraction and Raman, allowed to assess the amorphous nature of the deposited films as well as to determine the base pressure that prevents boron oxide formation. In addition the crystallization dynamics has been characterized showing that film crystallinity already improves at relatively low temperatures (800 {deg}C). Elastic properties of the boron films have been determined by Brillouin spectroscopy. Finally, micro-hardness tests have been used to explore cohesion and hardness of B films deposited on aluminum, silicon and alumina. The reported deposition strategy allows the growth of reliable boron coatings paving the way for their use in many technology fields.
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