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Recent theoretical and experimental studies have shown that imaging with resolution well beyond the diffraction limit can be obtained with so-called superlenses. Images formed by such superlenses are, however, in the near field only, or a fraction of wavelength away from the lens. In this paper, we propose a far-field superlens (FSL) device which is composed of a planar superlens with periodical corrugation. We show in theory that when an object is placed in close proximity of such a FSL, a unique image can be formed in far-field. As an example, we demonstrate numerically that images of 40 nm lines with a 30 nm gap can be obtained from far-field data with properly designed FSL working at 376nm wavelength.
We study the possibility of creating spatial patterns having subwavelength size by using the so-called dark states formed by the interaction between atoms and optical fields. These optical fields have a specified spatial distribution. Our experiments
Near-field scanning optical microscopy has been an indispensable tool for designing, characterizing and understanding the functionalities of diverse nanoscale photonic devices. As the advances in fabrication technology have driven the devices smaller
The resolution of optical imaging devices is ultimately limited by the diffraction of light. To circumvent this limit, modern super-resolution microscopy techniques employ active interaction with the object by exploiting its optical nonlinearities, n
Speckle patterns have been widely used in imaging techniques such as ghost imaging, dynamic speckle illumination microscopy, structured illumination microscopy, and photoacoustic fluctuation imaging. Recent advances in the ability to control the stat
Super-oscillating beams can be used to create light spots whose size is below the diffraction limit with a side ring of high intensity adjacent to them. Optical traps made of the super-oscillating part of such beams exhibit superior localization of s