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This work focuses on the characterization of various bulk silicon (Si) samples using Fourier Transform InfraRed (FTIR) and grating spectrometers in order to get them suitable for applications in astronomy. Different samples at different impurity concentrations were characterized by measuring their transmittance in the infrared region. Various lines due to residual impurity absorption were identifed and temperature dependence of impurity absorption is presented. Concentrations of doped samples (rho ~ 0.2 - 25000 Ohm cm) were determined from impurity absorption at low temperatures and from Drude free carrier absorption at 300K.
One of the solutions enabling performance progress, which can overcome the downsizing limit in silicon technology, is the integration of different functional optoelectronic devices within a single chip. Silicon with its indirect band gap has poor opt
In recent years, we have seen a rapid progress in the field of graphene plasmonics, motivated by graphenes unique electrical and optical properties, tunabilty, long-lived collective excitation and their extreme light confinement. Here, we review the
A true monolithic infrared photonics platform is within the reach if strain and bandgap energy can be independently engineered in SiGeSn semiconductors. However, this Si-compatible family of group-IV semiconductors is typically strained and inherentl
Infrared spectroscopy is a powerful tool for basic and applied science. The molecular spectral fingerprints in the 3 um to 20 um region provide a means to uniquely identify molecular structure for fundamental spectroscopy, atmospheric chemistry, trac
Photoluminescence (PL) spectra of single silicon vacancy (SiV) centers frequently feature very narrow room temperature PL lines in the near-infrared (NIR) spectral region, mostly between 820 nm and 840 nm, in addition to the well known zero-phonon-li