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تسجيل مستخدم جديدMeasurement of surface alpha-acrivity of different samples with ion pulse ionization chamber
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Yu.M.Gavriljuk
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The construction of an ion pulse ionization chamber aimed at measuring ultra-low levels of surface alpha-activity of different samples is described. The results of measurement carried out with alpha-source and copper samples and light-reflecting film VM2000 are presented.
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