Nanoscale Fe3O4 epitaxial thin film has been synthesized on MgO/GaAs(100) spintronic heterostructure, and studied with X-ray magnetic circular dichroism (XMCD). We have observed a total magnetic moment of (3.32 +- 0.1) uB/f.u., retaining 83% of the b
ulk value. Unquenched orbital moment of (0.47 +- 0.05) uB/f.u. has been confirmed by carefully applying the sum rule. The results offer direct experimental evidence of the bulk-like total magnetic moment and a large orbital moment in the nanoscale fully epitaxial Fe3O4/MgO/GaAs(100) heterostructure, which is significant for spintronics applications.
The spin and orbital magnetic moments of the Fe3O4 epitaxial ultrathin film synthesized by plasma assisted simultaneous oxidization on MgO(100) have been studied with X-ray magnetic circular dichroism (XMCD). The ultrathin film retains a rather large
total magnetic moment, i.e. (2.7+-0.15) uB/f.u., which is ~ 70% of that for the bulk-like Fe3O4. A significant unquenched orbital moment up to (0.54+-0.05) uB/f.u. was observed, which could come from the symmetry breaking at the Fe3O4/MgO interface. Such sizable orbital moment will add capacities to the Fe3O4-based spintronics devices in the magnetization reversal by the electric field.
A solution to the stability of capacitor-less low-dropout regulators with a 4pF Miller capacitor in Multi-level current amplifier is proposed. With the Miller compensation, a more than 50{deg}phase margin is guaranteed in full load. An extra fast tra
nsient circuit is adopted to reduce stable time and peak voltage. When the load changes from light to heavy, the peak voltage is 40mV and chip quiescent current is only 45uA.
We report very large bandgap enhancement in SrTiO3 (STO) films (fabricated by pulsed laser deposition below 800 {deg}C), which can be up to 20% greater than the bulk value, depending on the deposition temperature. The origin is comprehensively invest
igated and finally attributed to Sr/Ti antisite point defects, supported by density functional theory calculations. More importantly, the bandgap enhancement can be utilized to tailor the electronic and magnetic phases of the two-dimensional electron gas (2DEG) in STO-based interface systems. For example, the oxygen-vacancy-induced 2DEG (2DEG-V) at the interface between amorphous LaAlO3 and STO films is more localized and the ferromagnetic order in the STO-film-based 2DEG-V can be clearly seen from low-temperature magnetotransport measurements. This opens an attractive path to tailor electronic, magnetic and optical properties of STO-based oxide interface systems under intensive focus in the oxide electronics community. Meanwhile, our study provides key insight into the origin of the fundamental issue that STO films are difficult to be doped into the fully metallic state by oxygen vacancies.
We report that in unannealed LaAlO3/SrTiO3 (LAO/STO) heterostructures the critical thickness for the appearance of the two-dimensional electron gas can be less than 4 unit cell (uc), the interface is conducting even for STO substrates with mixed term
inations and the low-temperature resistance upturn in LAO/STO heterostructures with thick LAO layers strongly depends on laser fluence. Our experimental results provide fundamental insights into the different roles played by oxygen vacancies and polarization catastrophe in the two-dimensional electron gas in crystalline LAO/STO heterostructures.
Localization of electrons in the two-dimensional electron gas at the LaAlO$_3$/SrTiO$_3$ interface is investigated by varying the channel thickness in order to establish the nature of the conducting channel. Layers of SrTiO$_3$ were grown on NdGaO$_3
$ (110) substrates and capped with LaAlO$_3$. When the SrTiO$_3$ thickness is $leq 6$ unit cells, most electrons at the interface are localized, but when the number of SrTiO$_3$ layers is 8-16, the free carrier density approaches $3.3 times 10^{14}$ cm$^{-2}$, the value corresponding to charge transfer of 0.5 electron per unit cell at the interface. The number of delocalized electrons decreases again when the SrTiO$_3$ thickness is $geq 20$ unit cells. The $sim{4}$ nm conducting channel is therefore located significantly below the interface. The results are explained in terms of Anderson localization and the position of the mobility edge with respect to the Fermi level.
The relative importance of atomic defects and electron transfer in explaining conductivity at the crystalline LaAlO3/SrTiO3 interface has been a topic of debate. Metallic interfaces with similar electronic properties produced by amorphous oxide overl
ayers on SrTiO3 have called in question the original polarization catastrophe model. We resolve the issue by a comprehensive comparison of (100)-oriented SrTiO3 substrates with crystalline and amorphous overlayers of LaAlO3 of different thicknesses prepared under different oxygen pressures. For both types of overlayers, there is a critical thickness for the appearance of conductivity, but its value is always 4 unit cells (around 1.6 nm) for the oxygen-annealed crystalline case, whereas in the amorphous case, the critical thickness could be varied in the range 0.5 to 6 nm according to the deposition conditions. Subsequent ion milling of the overlayer restores the insulating state for the oxygen-annealed crystalline heterostructures but not for the amorphous ones. Oxygen post-annealing removes the oxygen vacancies, and the interfaces become insulating in the amorphous case. However, the interfaces with a crystalline overlayer remain conducting with reduced carrier density. These results demonstrate that oxygen vacancies are the dominant source of mobile carriers when the LaAlO3 overlayer is amorphous, while both oxygen vacancies and polarization catastrophe contribute to the interface conductivity in unannealed crystalline LaAlO3/SrTiO3 heterostructures, and the polarization catastrophe alone accounts for the conductivity in oxygen-annealed crystalline LaAlO3/SrTiO3 heterostructures. Furthermore, we find that the crystallinity of the LaAlO3 layer is crucial for the polarization catastrophe mechanism in the case of crystalline LaAlO3 overlayers.
The cross section for $e^+ e^- to pi^+ pi^- J/psi$ between 3.8 GeV and 5.5 GeV is measured with a 967 fb$^{-1}$ data sample collected by the Belle detector at or near the $Upsilon(nS)$ ($n = 1, 2, ..., 5$) resonances. The Y(4260) state is observed, a
nd its resonance parameters are determined. In addition, an excess of $pi^+ pi^- J/psi$ production around 4 GeV is observed. This feature can be described by a Breit-Wigner parameterization with properties that are consistent with the Y(4008) state that was previously reported by Belle. In a study of $Y(4260) to pi^+ pi^- J/psi$ decays, a structure is observed in the $M(pi^pmjpsi)$ mass spectrum with $5.2sigma$ significance, with mass $M=(3894.5pm 6.6pm 4.5) {rm MeV}/c^2$ and width $Gamma=(63pm 24pm 26)$ MeV/$c^{2}$, where the errors are statistical and systematic, respectively. This structure can be interpreted as a new charged charmonium-like state.
The surface termination of (100)-oriented LaAlO3 (LAO) single crystals was examined by atomic force microscopy and optimized to produce a single-terminated atomically flat surface by annealing. Then the atomically flat STO film was achieved on a sing
le-terminated LAO substrate, which is expected to be similar to the n-type interface of two-dimensional electron gas (2DEG), i.e., (LaO)-(TiO2). Particularly, that can serve as a mirror structure for the typical 2DEG heterostructure to further clarify the origin of 2DEG. This newly developed interface was determined to be highly insulating. Additionally, this study demonstrates an approach to achieve atomically flat film growth based on LAO substrates.
THGEMs (THick Gas Electron Multiplier) of varying thickness, hole diameter and hole pitch have been studied. For a thinner-THGEM of thickness 0.2 mm, with hole diameter 0.2 mm, pitch 0.2 mm and narrow (5-10 {mu}m) rim, the performance of gain versus
high voltage with different gas mixtures have been studied using 5.9 keV X-rays. In general, a gain of around 3times10^3 was obtained with a single board in Ar/iC4H10, and gains higher than 10^4 were obtained in Ne mixture at lower voltage. The dependence of the energy resolution on the drift and induction electric fields was measured and an energy resolution of 15.9% was obtained. A curved thinner-THGEM chamber with one-dimensional readout has been assembled for use in the diffraction studies at the Beijing Synchrotron Radiation Facility (BSRF). A cosmic-ray muon hodoscope based on thinner-THGEM was developed as a teaching experiment for the Graduate University of the Chinese Academy of Sciences (GUCAS).
