Graphite based Schottky diodes formed on Si, GaAs and 4H-SiC substrates

We demonstrate the formation of semimetal graphite/semiconductor Schottky barriers where the semiconductor is either silicon (Si), gallium arsenide (GaAs) or 4H-silicon carbide (4H-SiC). Near room temperature, the forward-bias diode characteristics are well described by thermionic emission, and the extracted barrier heights, which are confirmed by capacitance voltage measurements, roughly follow the Schottky-Mott relation. Since the outermost layer of the graphite electrode is a single graphene sheet, we expect that graphene/semiconductor barriers will manifest similar behavior.

Ultra-Thin Silver Films obtained by Sequential Quench-Anneal Processing

We have used the two-step growth technique, quench condensing followed by an anneal, to grow ultra thin films of silver on glass substrates. As has been seen with semiconductor substrates this process produces a metastable homogeneous covering of silver. By measuring the in situ resistance of the film during growth we are able to see that the low temperature growth onto substrates held at 100 Kelvin produces a precursor phase that is insulating until the film has been annealed. The transformation of the precursor phase into the final, metallic silver film occurs at a characteristic temperature near 150K where the sample reconstructs. This reconstruction is accompanied by a decrease in resistance of up to 10 orders of magnitude.