Subscribe to the gold package and get unlimited access to Shamra Academy
Register a new userPhysical Mechanism behind the Hysteresis-free Negative Capacitance Effect in Metal-Ferroelectric-Insulator-Metal Capacitors with Dielectric Leakage and Interfacial Trapped Charges
161
0
0.0
(
0
)
Ask ChatGPT about the research
No Arabic abstract
The negative capacitance (NC) stabilization of a ferroelectric (FE) material can potentially provide an alternative way to further reduce the power consumption in ultra-scaled devices and thus has been of great interest in technology and science in the past decade. In this article, we present a physical picture for a better understanding of the hysteresis-free charge boost effect observed experimentally in metal-ferroelectric-insulator-metal (MFIM) capacitors. By introducing the dielectric (DE) leakage and interfacial trapped charges, our simulations of the hysteresis loops are in a strong agreement with the experimental measurements, suggesting the existence of an interfacial oxide layer at the FE-metal interface in metal-ferroelectric-metal (MFM) capacitors. Based on the pulse switching measurements, we find that the charge enhancement and hysteresis are dominated by the FE domain viscosity and DE leakage, respectively. Our simulation results show that the underlying mechanisms for the observed hysteresis-free charge enhancement in MFIM may be physically different from the alleged NC stabilization and capacitance matching. Moreover, the link between Merzs law and the phenomenological kinetic coefficient is discussed, and the possible cause of the residual charges observed after pulse switching is explained by the trapped charge dynamics at the FE-DE interface. The physical interpretation presented in this work can provide important insights into the NC effect in MFIM capacitors and future studies of low-power logic devices.
rate research
Read More
This paper investigates the thermodynamic driving force of transient negative capacitance (NC) in the series circuit of the resistor and ferroelectric capacitor (R-FEC). We find that the widely used Landau-Khalatnikov (L-K) theory, that is, the minimum of the Gibbs free energy, is inapplicable to explain the transient NC. The thermodynamic driving force of the transient NC phenomenon is the minimum of the difference between the elastic Gibbs free energy and the electric polarization work. The appearance of the transient NC phenomenon is not due to the widely accepted view that the ferroelectric polarization goes through the negative curvature region of elastic Gibbs free energy landscape (Ga). Instead, the transient NC phenomenon appears when the energy barrier of Ga disappears. The transient NC is dependent on both the intrinsic ferroelectric material parameters and extrinsic factors in the R-FEC circuit.
Integrating negative capacitance (NC) into the field-effect transistors promises to break fundamental limits of power dissipation known as Boltzmann tyranny. However, realization of the stable static negative capacitance in the non-transient regime without hysteresis remains a daunting task. Here we show that the failure to implement the NC stems from the lack of understanding that its origin is fundamentally related with the inevitable emergence of the domain state. We put forth an ingenious design for the ferroelectric domain-based field-effect transistor with the stable reversible static negative capacitance. Using dielectric coating of the ferroelectric capacitor enables the tunability of the negative capacitance improving tremendously the performance of the field-effect transistors.
The so-called Boltzmann Tyranny defines the fundamental thermionic limit of the subthreshold slope (SS) of a metal-oxide-semiconductor field-effect transistor (MOSFET) at 60 mV/dec at room temperature and, therefore, precludes the lowering of the supply voltage and the overall power consumption. Adding a ferroelectric negative capacitor to the gate stack of a MOSFET may offer a promising solution to bypassing this fundamental barrier. Meanwhile, two-dimensional (2D) semiconductors, such as atomically thin transition metal dichalcogenides (TMDs) due to their low dielectric constant, and ease of integration in a junctionless transistor topology, offer enhanced electrostatic control of the channel. Here, we combine these two advantages and demonstrate for the first time a molybdenum disulfide (MoS2) 2D steep slope transistor with a ferroelectric hafnium zirconium oxide layer (HZO) in the gate dielectric stack. This device exhibits excellent performance in both on- and off-states, with maximum drain current of 510 {mu}A/{mu}m, sub-thermionic subthreshold slope and is essentially hysteresis-free. Negative differential resistance (NDR) was observed at room temperature in the MoS2 negative capacitance field-effect-transistors (NC-FETs) as the result of negative capacitance due to the negative drain-induced-barrier-lowering (DIBL). High on-current induced self-heating effect was also observed and studied.
Negative capacitance (NC) in ferroelectrics, which stems from the imperfect screening of polarization, is considered a viable approach to lower voltage operation in the field-effect transistors (FETs) used in logic switches. In this paper, we discuss the implications of the transient nature of negative capacitance for its practical application. It is suggested that the NC effect needs to be characterized at the proper time scale to identify the type of circuits where functional NC-FETs can be used effectively.
We introduce phase-change material Ge2Sb2Te5 (GST) into metal-insulator-metal (MIM) waveguide systems to realize chipscale plasmonic modulators and switches in the telecommunication band. Benefitting from the high contrast of optical properties between amorphous and crystalline GST, the three proposed structures can act as reconfigurable and non-volatile modulators and switches with excellent modulation depth 14 dB and fast response time in nanosecond, meanwhile possessing small footprints, simple frameworks and easy fabrication. This work provides new solutions to design active devices in MIM waveguide systems, and can find potential applications in more compact all-optical circuits for information processing and storage.
Log in to be able to interact and post comments
comments
Fetching comments
Sign in to be able to follow your search criteria
