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Microstrip superconducting quantum interference device amplifiers with submicron Josephson junctions: enhanced gain at gigahertz frequencies

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 Added by Michael P. DeFeo
 Publication date 2010
  fields Physics
and research's language is English




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We present measurements of an amplifier based on a dc superconducting quantum interference device (SQUID) with submicron Al-AlOx-Al Josephson junctions. The small junction size reduces their self-capacitance and allows for the use of relatively large resistive shunts while maintaining nonhysteretic operation. This leads to an enhancement of the SQUID transfer function compared to SQUIDs with micron-scale junctions. The device layout is modified from that of a conventional SQUID to allow for coupling signals into the amplifier with a substantial mutual inductance for a relatively short microstrip coil. Measurements at 310 mK exhibit gain of 32 dB at 1.55 GHz.



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Using non-equilibrium Greens functions, we studied numerically the transport properties of a Josephson junction, superconductor-topological insulator-superconductor hybrid system. Our numerical calculation shows first that proximity-induced superconductivity is indeed observed in the edge states of a topological insulator adjoining two superconducting leads and second that the special characteristics of topological insulators endow the edge states with an enhanced proximity effect with a superconductor but do not forbid the bulk states to do the same. In a size-dependent analysis of the local current, it was found that a few residual bulk states can lead to measurable resistance, whereas because these bulk states spread over the whole sample, their contribution to the interference pattern is insignificant when the sample size is in the micrometer range. Based on these numerical results, it is concluded that the apparent disappearance of residual bulk states in the superconducting interference process as described in Ref. [onlinecite{HartNautrePhys2014f}] is just due to the effects of size: the contribution of the topological edge states outweighs that of the residual bulk states.
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For high-performance superconducting quantum devices based on Josephson junctions (JJs) decreasing lateral sizes is of great importance. Fabrication of sub-mu m JJs is challenging due to non-flat surfaces with step heights of up to several 100 nm generated during the fabrication process. We have refined a fabrication process with significantly decreased film thicknesses, resulting in almost flat surfaces at intermediate steps during the JJ definition. In combination with a mix-&-match process, combining electron-beam lithography (EBL) and conventional photolithography, we can fabricate JJs with lateral dimensions down to 0.023 mu m^2. We propose this refined process as an alternative to the commonly used chemical-mechanical polishing (CMP) procedure. We present transport measurements of JJs at 4.2 K that yield critical-current densities in the range from 50 to 10^4 A/cm^2. Our JJ process yields excellent quality parameters, Rsg/Rn up to ~50 and Vgap up to 2.81 mV, and also allows the fabrication of high-quality sub-mu m wide long JJs (LJJs) for the study of Josephson vortex behavior. The developed technique can also be used for similar multilayer processes and is very promising for fabricating sub-mu m JJs for quantum devices such as SQUIDs, qubits and SIS mixers.
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