This search aims to study the adsorption of Cu ions from their solutions
on the surface of silicon oxide.
These experiments were in five groups, at the first three groups the
amount of the adsorbent was constant, and the concentration of the
adso
rbing ions was changed, after the adsorption is ended the
concentration of Cu remaining ions in the solution was measured, then
the quantities of the adsorbing ions on the surface of silicon oxide were
determined.
