اشترك بالحزمة الذهبية واحصل على وصول غير محدود شمرا أكاديميا
تسجيل مستخدم جديدObservation of band structure and density of states effects in Co-based magnetic tunnel junctions
58
0
0.0
(
0
)
اسأل ChatGPT حول البحث
ﻻ يوجد ملخص باللغة العربية
Utilizing Co/Al$_2$O$_3$/Co magnetic tunnel junctions (MTJs) with Co electrodes of different crystalline phases, a clear relationship between electrode structure and junction transport properties is presented. For junctions with one fcc(111) textured and one polycrystalline (poly-phase and poly-directional) Co electrode, a strong asymmetry is observed in the magnetotransport properties, while when both electrodes are polycrystalline the magnetotransport is essentially symmetric. These observations are successfully explained within a model based on ballistic tunneling between the calculated band structures (DOS) of fcc-Co and hcp-Co.
قيم البحث
اقرأ أيضاً
We propose energy band engineering to enhance tunneling electroresistance (TER) in ferroelectric tunnel junctions (FTJs). We predict that an ultrathin dielectric layer with a smaller band gap, embedded into a ferroelectric barrier layer, acts as a sw
itch controlling high and low conductance states of an FTJ depending on polarization orientation. Using first-principles modeling based on density functional theory, we investigate this phenomenon for a prototypical SrRuO3/BaTiO3/SrRuO3 FTJ with a BaSnO3 monolayer embedded in the BaTiO3 barrier. We show that in such a composite-barrier FTJ, ferroelectric polarization of BaTiO3 shifts the conduction band minimum of the BaSnO3 monolayer above or below the Fermi energy depending on polarization orientation. The resulting switching between direct and resonant tunneling leads to a TER effect with a giant ON/OFF conductance ratio. The proposed resonant band engineering of FTJs can serve as a viable tool to enhance their performance useful for device application.
Manipulation of tunneling spin-polarized electrons via a ferroelectric interlayer sandwiched between two ferromagnetic electrodes, dubbed Multiferroic Tunnel Junctions (MFTJs), can be achieved not only by the magnetic alignments of two ferromagnets b
ut also by the electric polarization of the ferroelectric interlayer, providing great opportunities for next-generation multi-state memory devices. Here we show that a La0.67Sr0.33MnO3 (LSMO)/PbZr0.2Ti0.8O3(PZT)/Co structured MFTJ device can exhibit multilevel resistance states in the presence of gradually reversed ferroelectric domains via tunneling electro-resistance and tunneling magnetoresistance, respectively. The nonvolatile ferroelectric control in the MFTJ can be attributed to separate contributions arising from two independent ferroelectric channels in the PZT interlayer with opposite polarization. Our study shows the dominant role of mixed ferroelectric states on achieving accumulative electrical modulation of multilevel resistance states in MFTJs, paving the way for multifunctional device applications.
The impact of 400 keV $Ar^+$ ion irradiation on the magnetic and electrical properties of in-plane magnetized magnetic tunnel junction (MTJ) stacks was investigated by ferromagnetic resonance, vibrating sample magnetometry and current-in-plane tunnel
ing techniques. The irradiation-induced changes of the magnetic anisotropy, coupling energies and tunnel magnetoresistance (TMR) exhibited a correlated dependence on the ion fluence, which allowed us to distinguish between two irradiation regimes. In the low-fluence regime, ${Phi} < 10^{14} cm^{-2}$, the parameters required for having a functioning MTJ were preserved: the anisotropy of the FeCoB free layer (FL) was weakly modulated following a small decrease in the saturation magnetization $M_S$; the TMR decreased continuously; the interlayer exchange coupling (IEC) and the exchange bias (EB) decreased slightly. In the high-fluence regime, ${Phi} > 10^{14} cm^{-2}$, the MTJ was rendered inoperative: the modulation of the FL anisotropy was strong, caused by a strong decrease in $M_S$, ascribed to a high degree of interface intermixing between the FL and the Ta capping; the EB and IEC were also lost, likely due to intermixing of the layers composing the synthetic antiferromagnet; and the TMR vanished due to the irradiation-induced deterioration of the MgO barrier and MgO/FeCoB interfaces. We demonstrate that the layers surrounding the FL play a decisive role in determining the trend of the magnetic anisotropy evolution resulting from the irradiation, and that an ion-fluence window exists where such a modulation of magnetic anisotropy can occur, while not losing the TMR or the magnetic configuration of the MTJ.
We have studied magnetic tunnel junction (MTJ) thin-film stacks using the First Order Reversal Curve (FORC) method. These have very sharp structures in the FORC distribution, unlike most particulate systems or patterned films. These structures are ha
rd to study using conventional FORC analysis programs that require smoothing, because this washes out the structure. We have used a new analysis program (FORC+) that is designed to distinguish fine-scale structure from noise without the use of smoothing, to identify these structures and gain information about the switching mechanism of the stack.
The magnetic stray field is an unavoidable consequence of ferromagnetic devices and sensors leading to a natural asymmetry in magnetic properties. Such asymmetry is particularly undesirable for magnetic random access memory applications where the fre
e layer can exhibit bias. Using atomistic dipole-dipole calculations we numerically simulate the stray magnetic field emanating from the magnetic layers of a magnetic memory device with different geometries. We find that edge effects dominate the overall stray magnetic field in patterned devices and that a conventional synthetic antiferromagnet structure is only partially able to compensate the field at the free layer position. A granular reference layer is seen to provide near-field flux closure while additional patterning defects add significant complexity to the stray field in nanoscale devices. Finally we find that the stray field from a nanoscale antiferromagnet is surprisingly non-zero arising from the imperfect cancellation of magnetic sublattices due to edge defects. Our findings provide an outline of the role of different layer structures and defects in the effective stray magnetic field in nanoscale magnetic random access memory devices and atomistic calculations provide a useful tools to study the stray field effects arising from a wide range of defects.
سجل دخول لتتمكن من نشر تعليقات
التعليقات
جاري جلب التعليقات
سجل دخول لتتمكن من متابعة معايير البحث التي قمت باختيارها
