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Ultra-high mobility two-dimensional electron gas in a SiGe/Si/SiGe quantum well

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 نشر من قبل Alexander Shashkin
 تاريخ النشر 2014
  مجال البحث فيزياء
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We report the observation of an electron gas in a SiGe/Si/SiGe quantum well with maximum mobility up to 240 m^2/Vs, which is noticeably higher than previously reported results in silicon-based structures. Using SiO, rather than Al_2O_3, as an insulator, we obtain strongly reduced threshold voltages close to zero. In addition to the predominantly small-angle scattering well known in the high-mobility heterostructures, the observed linear temperature dependence of the conductivity reveals the presence of a short-range random potential.



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