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We report a simulation of the metal-insulator transition in a model of a doped semiconductor that treats disorder and interactions on an equal footing. The model is analyzed using density functional theory. From a multi-fractal analysis of the Kohn-S ham eigenfunctions, we find $ u approx 1.3$ for the critical exponent of the correlation length. This differs from that of Andersons model of localization and suggests that the Coulomb interaction changes the universality class of the transition.
We report a numerical analysis of Anderson localization in a model of a doped semiconductor. The model incorporates the disorder arising from the random spatial distribution of the donor impurities and takes account of the electron-electron interacti ons between the carriers using density functional theory in the local density approximation. Preliminary results suggest that the model exhibits a metal-insulator transition.
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