The technology of wet etching allowing fabrication of standalone BiSrCaCuO mesa structures was proposed. The produced mesas can be produced much thicker than ones usually being studied. The time required for the fabrication is much smaller in compari
son with the standard method of ion milling. The process used is controllable which provides acceptable precision of mesa fabrication. The current-voltage characteristics of the sample showing Josephson nature were obtained. The qualitative comparison with characteristics of similar structures fabricated by other groups was carried out.
