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Register a new userOptoelectronic optimization of graded-bandgap thin-film AlGaAs solar cells
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An optoelectronic optimization was carried out for an AlGaAs solar cell containing (i) an n-AlGaAs absorber layer with a graded bandgap and (ii) a periodically corrugated Ag backreflector combined with localized ohmic Pd-Ge-Au backcontacts. The bandgap of the absorber layer was varied either sinusoidally or linearly. An efficiency of 33.1% with the 2000-nm-thick n-AlGaAs absorber layer is predicted with linearly graded bandgap along with silver backreflector and localized ohmic backcontacts, in comparison to 27.4% efficiency obtained with homogeneous bandgap and a continuous ohmic backcontact. Sinusoidal grading of the bandgap {is predicted to enhance} the maximum efficiency to 34.5%. Thus, grading the bandgap of the absorber layer, along with a periodically corrugated Ag backreflector and localized ohmic Pd-Ge-Au backcontacts can help realize ultrathin and high-efficient AlGaAs solar cells for terrestrial applications.
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A coupled optoelectronic model was implemented along with the differential evolution algorithm to assess the efficacy of grading the bandgap of the CZTSSe layer for enhancing the power conversion efficiency of thin-film CZTSSe solar cells. Both linearly and sinusoidally graded bandgaps were examined, with the molybdenum backreflector in the solar cell being either planar or periodically corrugated. Whereas an optimally graded bandgap can dramatically enhance the efficiency, the effect of periodically corrugating the backreflector is modest at best. An efficiency of 21.74% is predicted with sinusoidal grading of a 870-nm-thick CZTSSe layer, in comparison to 12.6% efficiency achieved experimentally with a 2200-nm-thick homogeneous CZTSSe layer. High electron-hole-pair generation rates in the narrow-bandgap regions and a high open-circuit voltage due to a wider bandgap close to the front and rear faces of the CZTSSe layer are responsible for the high enhancement of efficiency.
The power conversion efficiency of an ultrathin CIGS solar cell was maximized using a coupled optoelectronic model to determine the optimal bandgap grading of the nonhomogeneous CIGS layer in the thickness direction. The bandgap of the CIGS layer was either sinusoidally or linearly graded, and the solar cell was modeled to have a metallic backreflector corrugated periodically along a fixed direction in the plane. The model predicts that specially tailored bandgap grading can significantly improve the efficiency, with much smaller improvements due to the periodic corrugations. An efficiency of 27.7% with the conventional 2200-nm-thick CIGS layer is predicted with sinusoidal bandgap grading, in comparison to 22% efficiency obtained experimentally with homogeneous bandgap. Furthermore, the inclusion of sinusoidal grading increases the predicted efficiency to 22.89% with just a 600-nm-thick CIGS layer. These high efficiencies arise due to a large electron-hole-pair generation rate in the narrow-bandgap regions and the elevation of the open-circuit voltage due to a wider bandgap in the region toward the front surface of the CIGS layer. Thus, bandgap nonhomogeneity, in conjunction with periodic corrugation of the backreflector, can be effective in realizing ultrathin CIGS solar cells that can help overcome the scarcity of indium.
One of the remaining obstacles to approaching the theoretical efficiency limit of crystalline silicon (c-Si) solar cells is the exceedingly high interface recombination loss for minority carriers at the Ohmic contacts. In ultra-thin-film c-Si solar cells, this contact recombination loss is far more severe than for traditional thick cells due to the smaller volume and higher minority carrier concentration of the former. This paper presents a novel design of an electron passing (Ohmic) contact to n-type Si that is hole-blocking with significantly reduced hole recombination. This contact is formed by depositing a thin titanium dioxide (TiO2) layer to form a silicon metal-insulator-semiconductor (MIS) contact. A 2 {mu}m thick Si cell with this TiO2 MIS contact achieved an open circuit voltage (Voc) of 645 mV, which is 10 mV higher than that of an ultra-thin cell with a metal contact. This MIS contact demonstrates a new path for ultra-thin-film c-Si solar cells to achieve high efficiencies as high as traditional thick cells, and enables the fabrication of high-efficiency c-Si solar cells at a lower cost.
Compared to traditional pn-junction photovoltaics, hot carrier solar cells offer potentially higher efficiency by extracting work from the kinetic energy of photogenerated hot carriers before they cool to the lattice temperature. Hot carrier solar cells have been demonstrated in high-bandgap ferroelectric insulators and GaAs/AlGaAs heterostructures, but so far not in low-bandgap materials, where the potential efficiency gain is highest. Recently, a high open-circuit voltage was demonstrated in an illuminated wurtzite InAs nanowire with a low bandgap of 0.39 eV, and was interpreted in terms of a photothermoelectric effect. Here, we point out that this device is a hot carrier solar cell and discuss its performance in those terms. In the demonstrated devices, InP heterostructures are used as energy filters in order to thermoelectrically harvest the energy of hot electrons photogenerated in InAs absorber segments. The obtained photovoltage depends on the heterostructure design of the energy filter and is therefore tunable. By using a high-resistance, thermionic barrier an open-circuit voltage is obtained that is in excess of the Shockley-Queisser limit. These results provide generalizable insight into how to realize high voltage hot carrier solar cells in low-bandgap materials, and therefore are a step towards the demonstration of higher efficiency hot carrier solar cells.
In terms of mixing graded TiO2 and SnO2 powders by solid-state reaction method, ITO was prepared. Using electron beam gun technology, ITO films with different thicknesses were prepared. The influence of film thickness on structure, electrical and optical properties was studied. The XRD patterns were utilized to determine the structural parameters (lattice strain and crystallite size) of ITO with different thicknesses. It is observed that the average crystallite size increases as the film thickness increases, but the lattice strain decreases. SEM shows that as the film thickness increases, the grain size of ITO increases and improves. The electrical properties of ITO films with different thicknesses were measured by the standard four-point probe method. It can be seen that as the thickness of the ITO film increases from 75 nm to 325 nm, the resistivity decreases from 29x10^-4 Ohm/cm to 1.65x10^-4 Ohm/cm. This means that ITO films with lower electrical properties will be more suitable for high-efficiency CdTe solar cells. Three optical layer models (adhesive layer of the substrate/B-spline layer of ITO film/surface roughness layer) are used to calculate the film thickness with high-precision ellipsometry. In the higher T(lambda) and R(lambda) absorption regions, the absorption coefficient is determined to calculate the optical energy gap, which increases from 3.56 eV to 3.69 eV. Finally, the effects of ITO layers of various thicknesses on the performance of CdS/CdTe solar cells are also studied. When the thickness of the ITO window layer is 325 nm, Voc = 0.82 V, Jsc = 17 mA/cm2, and FF = 57.4%, the highest power conversion efficiency (PCE) is 8.6%.
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