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Register a new userMass Transfer Mechanism in Real Crystals by Pulsed Laser Irradiation
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Added by
Anatoliy Zhuravlyov
Publication date
2002
fields
Physics
and research's language is
English
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The dynamic processes in the surface layers of metals subjected activity of a pulsing laser irradiation, which destroyed not the crystalline structure in details surveyed. The procedure of calculation of a dislocation density generated in bulk of metal during the relaxation processes and at repeated pulse laser action is presented. The results of evaluations coincide with high accuracy with transmission electron microscopy dates. The dislocation-interstitial mechanism of laser-stimulated mass-transfer in real crystals is presented on the basis of the ideas of the interaction of structure defects in dynamically deforming medium. The good compliance of theoretical and experimental results approves a defining role of the presented mechanism of mass transfer at pulse laser action on metals. The possible implementation this dislocation-interstitial mechanism of mass transfer in metals to other cases of pulsing influences is justified
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Cu2Ta4O12 (CTaO) thin films were successfully deposited on Si(100) substrates by pulsed-laser deposition technique. The crystalline structure and the surface morphology of the CTaO thin films were strongly affected by substrate temperature, oxygen pressure and target - substrate distance. In general during deposition of CTaO the formation of a Ta2O5 phase appeared, on which CTaO grew with different orientations. We report on the experimental set-up, details for film deposition and the film properties determined by SEM, EDX and XRD.
Films of the molecular nanomagnet, Mn12-acetate, have been deposited using pulsed laser deposition and a novel variant, matrix assisted pulsed laser evaporation. The films have been characterized by X-ray photoelectron spectroscopy, mass spectrometry and magnetic hysteresis. The results indicate that an increase in laser energy and/or pulse frequency leads to fragmentation of Mn12, whereas its chemical and magnetic integrity is preserved at low laser energy (200 mJ). This technique allows the fabrication of patterned thin film systems of molecular nanomagnets for fundamental and applied experiments.
High quality Van der Waals chalcogenides are important for phase change data storage, thermoelectrics, and spintronics. Using a combination of statistical design of experiments and density functional theory, we clarify how the out-of-equilibrium van der Waals epitaxial deposition methods can improve the crystal quality of Sb2Te3 films. We compare films grown by radio frequency sputtering and pulsed laser deposition (PLD). The growth factors that influence the crystal quality for each method are different. For PLD grown films a thin amorphous Sb2Te3 seed layer most significantly influences the crystal quality. In contrast, the crystalline quality of films grown by sputtering is rather sensitive to the deposition temperature and less affected by the presence of a seed layer. This difference is somewhat surprising as both methods are out-of-thermal-equilibrium plasma-based methods. Non-adiabatic quantum molecular dynamics simulations show that this difference originates from the density of excited atoms in the plasma. The PLD plasma is more intense and with higher energy than that used in sputtering, and this increases the electronic temperature of the deposited atoms, which concomitantly increases the adatom diffusion lengths in PLD. In contrast, the adatom diffusivity is dominated by the thermal temperature for sputter grown films. These results explain the wide range of Sb2Te3 and superlattice crystal qualities observed in the literature. These results indicate that, contrary to popular belief, plasma-based deposition methods are suitable for growing high quality crystalline chalcogenides.
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