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Register a new userVery high frequency probes for atomic force microscopy with silicon optomechanics
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L Schwab
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Atomic force microscopy (AFM) has been constantly supporting nanosciences and nanotechnologies for over 30 years, being present in many fields from condensed matter physics to biology. It enables measuring very weak forces at the nanoscale, thus elucidating interactions at play in fundamental processes. Here we leverage the combined benefits of micro/nanoelectromechanical systems and cavity optomechanics to fabricate a sensor for dynamic mode AFM at a frequency above 100 MHz. This is two decades above the fastest commercial AFM probes, suggesting opportunity for measuring forces at timescales unexplored so far. The fabrication is achieved using very-large scale integration technologies inherited from photonic silicon circuits. The probes ring optomechanical cavity is coupled to a 1.55 um laser light and features a 130 MHz mechanical resonance mode with a quality factor of 900 in air. A limit of detection in displacement of 3.10-16 m/sqrt(Hz) is obtained, enabling the detection of the Brownian motion of the probe and paving the way for force sensing experiments in the dynamic mode with a working vibration amplitude in the picometer range. Inserted in a custom AFM instrument embodiment, this optomechanical sensor demonstrates the capacity to perform force-distance measurements and to maintain a constant interaction strength between tip and sample, an essential requirement for AFM applications. Experiments show indeed a stable closed-loop operation with a setpoint of 4 nN/nm for an unprecedented sub-picometer vibration amplitude, where the tip-sample interaction is mediated by a stretched water meniscus.
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High-frequency atomic force microscopy has enabled extraordinary new science through large bandwidth, high speed measurements of atomic and molecular structures. However, traditional optical detection schemes restrict the dimensions, and therefore the frequency, of the cantilever - ultimately setting a limit to the time resolution of experiments. Here we demonstrate optomechanical detection of low-mass, high-frequency nanomechanical cantilevers (up to 20 MHz) that surpass these limits, anticipating their use for single-molecule force measurements. These cantilevers achieve 2 fm / sqrt(Hz) displacement noise floors, and force sensitivity down to 132 aN / sqrt(Hz). Furthermore, the ability to resolve both in-plane and out-of-plane motion of our cantilevers opens the door for ultrasensitive multidimensional force spectroscopy, and optomechanical interactions, such as tuning of the cantilever frequency in situ, provide new opportunities in high-speed, high-resolution experiments.
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Optical tweezers are an invaluable tool for non-contact trapping and micro-manipulation, but their ability to facilitate high-throughput volumetric microrheology of biological samples for mechanobiology research is limited by the precise alignment associated with the excitation and detection of individual bead oscillations. In contrast, radiation pressure from a low numerical aperture optical beam can apply transversely localized force over an extended depth range. We propose photonic force optical coherence elastography (PF-OCE), leveraging phase-sensitive interferometric detection to track sub-nanometre oscillations of beads, embedded in viscoelastic hydrogels, induced by modulated radiation pressure. Since the displacements caused by ultra-low radiation-pressure force are typically obscured by absorption-mediated thermal effects, mechanical responses of the beads were isolated after independent measurement and decoupling of the photothermal response of the hydrogels. Volumetric imaging of bead mechanical responses in hydrogels with different agarose concentrations by PF-OCE was consistent with bulk mechanical characterization of the hydrogels by shear rheometry.
Atomic force microscopy (AFM) is an essential nanoinstrument technique for several applications such as cell biology and nanoelectronics metrology and inspection. The need for statistically significant sample sizes means that data collection can be an extremely lengthy process in AFM. The use of a single AFM instrument is known for its very low speed and not being suitable for scanning large areas, resulting in very-low-throughput measurement. We address this challenge by parallelizing AFM instruments. The parallelization is achieved by miniaturizing the AFM instrument and operating many of them simultaneously. This nanoinstrument has the advantages that each miniaturized AFM can be operated independently and that the advances in the field of AFM, both in terms of speed and imaging modalities, can be implemented more easily. Moreover, a parallel AFM instrument also allows one to measure several physical parameters simultaneously; while one instrument measures nano-scale topography, another instrument can measure mechanical, electrical or thermal properties, making it a Lab-on-an-Instrument. In this paper, a proof of principle (PoP) of such a parallel AFM instrument has been demonstrated by analyzing the topography of large samples such as semiconductor wafers. This nanoinstrument provides new research opportunities in the nanometrology of wafers and nanolithography masks by enabling real die-to-die and wafer-level measurements and in cell biology by measuring the nano-scale properties of a large number of cells.
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