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Register a new userIntegration of the Noncollinear Antiferromagnetic Metal Mn3Sn onto Ferroelectric Oxides for Electric-Field Control
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Non-collinear antiferromagnetic materials have received dramatically increasing attention in the field of spintronics as their exotic topological features such as the Berry-curvature-induced anomalous Hall effect and possible magnetic Weyl states could be utilized in future topological antiferromagnetic spintronic devices. In this work, we report the successful integration of the antiferromagnetic metal Mn3Sn thin films onto ferroelectric oxide PMN-PT. By optimizing growth, we realized the large anomalous Hall effect with small switching magnetic fields of several tens mT fully comparable to those of bulk Mn3Sn single crystals, anisotropic magnetoresistance and negative parallel magnetoresistance in Mn3Sn thin films with antiferromagnetic order, which are similar to the signatures of the Weyl state in bulk Mn3Sn single crystals. More importantly, we found that the anomalous Hall effect in antiferromagnetic Mn3Sn thin films can be manipulated by electric fields applied onto the ferroelectric materials, thus demonstrating the feasibility of Mn3Sn-based topological spintronic devices operated in an ultralow power manner.
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Ferrimagnets, which contain the advantages of both ferromagnets (detectable moments) and antiferromagnets (ultrafast spin dynamics), have recently attracted great attention. Here we report the optimization of epitaxial growth of a tetragonal perpendicularly magnetized ferrimagnet Mn2Ga on MgO. Electrical transport, magnetic properties and the anomalous Hall effect (AHE) were systematically studied. Furthermore, we successfully integrated high-quality epitaxial ferrimagnetic Mn2Ga thin films onto ferroelectric PMN-PT single crystals with a MgO buffer layer. It was found that the AHE of such a ferrimagnet can be effectively modulated by a small electric field over a large temperature range in a nonvolatile manner. This work thus demonstrates the great potential of ferrimagnets for developing high-density and low-power spintronic devices.
Using an electric field instead of an electric current (or a magnetic field) to tailor the electronic properties of magnetic materials is promising for realizing ultralow energy-consuming memory devices because of the suppression of Joule heating, especially when the devices are scaled to the nanoscale. In the review, we summarize recent results on the giant magnetization and resistivity modulation in a metamagnetic intermetallic alloy - FeRh, which is achieved by electric-field-controlled magnetic phase transitions in multiferroic heterostructures. Furthermore, the approach is extended to topological antiferromagnetic spintronics, which is currently receiving attention in the magnetic society, and the antiferromagnetic order parameter has been able to switch back and forth by a small electric field. In the end, we envision the possibility of manipulating exotic physical phenomena in the emerging topological antiferromagnetic spintronics field via the electric-field approach.
Magnetotransport is at the center of the spintronics. Mn3Sn, an antiferromagnet that has a noncollinear 120{deg} spin order, exhibits large anomalous Hall effect (AHE) at room temperature. But such a behavior has been remained elusive in Mn3Sn films. Here we report the observation of robust AHE up to room temperature in quasi-epitaxial Mn3Sn thin films, prepared by magnetron sputtering. The growth of both (11-20)- and (0001)-oriented Mn3Sn films provides a unique opportunity for comparing AHE in three different measurement configurations. When the magnetic field is swept along (0001) plane, such as the direction of [01-10] and [2-1-10] the films show comparatively higher anomalous Hall conductivity than its perpendicular counterpart ([0001]), irrespective of their respectively orthogonal current along [0001] or [01-10]. A quite weak ferromagnetic moment of 3 emu/cm^3 is obtained in (11-20)-oriented Mn3Sn films, guaranteeing the switching of the Hall signals with magnetization reversal. Our finding would advance the integration of Mn3Sn in antiferromagnetic spintronics.
Spin-polarized currents play a key role in spintronics. Recently, it has been found that antiferromagnets with a non-spin-degenerate band structure can efficiently spin-polarize electric currents, even though their net magnetization is zero. Among the antiferromagnetic metals with magnetic space group symmetry supporting this functionality, the noncollinear antiferromagnetic antiperovskites ANMn$_3$ (A = Ga, Ni, Sn, and Pt) are especially promising. This is due to their high Neel temperatures and a good lattice match to perovskite oxide substrates, offering possibilities of high structural quality heterostructures based on these materials. Here, we investigate the spin polarization of antiferromagnetic ANMn$_3$ metals using first-principles density functional theory calculations. We find that the spin polarization of the longitudinal currents in these materials is comparable to that in widely used ferromagnetic metals, and thus can be exploited in magnetic tunnel junctions and spin transfer torque devices. Moreover, for certain film growth directions, the out-of-plane transverse spin currents with a giant charge-to-spin conversion efficiency can be achieved, implying that the ANMn$_3$ antiperovskites can be used as efficient spin sources. These properties make ANMn$_3$ compounds promising for application in spintronics.
With exceptional electrical and mechanical properties and at the same time air-stability, layered MoSi2N4 has recently draw great attention. However, band structure engineering via strain and electric field, which is vital for practical applications, has not yet been explored. In this work, we show that the biaxial strain and external electric field are effective ways for the band gap engineering of bilayer MoSi$_2$N$_4$ and WSi$_2$N$_4$. It is found that strain can lead to indirect band gap to direct band gap transition. On the other hand, electric field can result in semiconductor to metal transition. Our study provides insights into the band structure engineering of bilayer MoSi$_2$N$_4$ and WSi$_2$N$_4$ and would pave the way for its future nanoelectronics and optoelectronics applications.
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