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Register a new userElectrophoretic deposition of WS2 flakes on nanoholes arrays. Role of the used suspension medium
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Here we optimized the electrophoretic deposition process for the fabrication of WS2 plasmonic nanohole integrated structures. We showed how the conditions used for the site selective deposition influenced the properties of the deposited flakes. In particular, we investigated the effect of different suspension medium used during the deposition both in the efficiency of the process and in the stability of WS2 flakes, which were deposited on a ordered arrays of plasmonic nanostructures.
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The bio-inertness of titanium and its alloys attracts their use as bone implants. However a bioactive coating is usually necessary for improving the bone bonding of such implants. In this study, electrophoretic deposition(EPD) of hydroxyapatite (HA) powder on titanium plate was performed using butanol as solvent under direct current (DC) and alternating current (AC) fields. The zeta potential of the suspensions was measured to understand their stability and the charge on the particles. Coating thickness was varied by adjusting the voltage and time of deposition. Surface morphology and cross section thickness were studied using scanning electron microscopy and image analysis software. Surface crack density was calculated from the micrographs. The results showed that the samples of similar thickness have higher grain density when coated using AC as compared to DC EPD. This facile but novel test proves the capability of AC-EPD to attain denser and uniform HA coatings from non-aqueous medium.
In this work the thermodynamics of the electrodeposition on nanoholes is analyzed. Different lattice-gas models of nanoholes, from parallelepiped geometry to the empty bulk of a nanoparticle, were considered. The models include curvature on the inner walls. Several stages of deposition are identified. Monte Carlo technique in the Grand Canonical Ensemble is used to determine isotherms, isosteric heat, energy per site, etc. The study is based on different ranges of energies and nanoholes sizes.
The dispersion of anatase phase TiO2 powder in aqueous suspensions was investigated by zeta-potential and agglomerate size analysis. The iso-electric point (IEP) of anatase was determined to be at pH 2.8 using monoprotic acids for pH adjustment. In comparison, it was found that the use of carboxylic acids, citric and oxalic, caused a decrease in zeta-potential through the adsorption of negatively charged groups to the particle surfaces. The use of these reagents was shown to enable effective anodic electrophoretic deposition (EPD) of TiO2 onto graphite substrates at low pH levels with a decreased level of bubble damage in comparison with anodic EPD from basic suspensions. The results obtained demonstrate that the IEP of TiO2 varies with the type of reagent used for pH adjustment. The low pH level of the IEP and the ability to decrease the zeta-potential through the use of carboxylic acids suggest that the anodic EPD of anatase is more readily facilitated than cathodic EPD.
The integration of two-dimensional transition metal dichalcogenide crystals (TMDCs) into a dielectric environment is critical for optoelectronic and photonic device applications. Here, we investigate the effects of direct deposition of different dielectric materials (Al$_2$O$_3$, SiO$_2$, SiN$_x$) onto atomically thin (monolayer) TMDC WS$_2$ on its optical response. Atomic layer deposition (ALD), electron beam evaporation (EBE), plasma enhanced chemical vapour deposition (PECVD), and magnetron sputtering methods of material deposition are investigated. The photoluminescence (PL) measurements reveal quenching of the excitonic emission after all deposition processes. The reduction in neutral exciton PL is linked to the increased level of charge doping and associated rise of the trion emission, and/or the localized (bound) exciton emission. Furthermore, Raman spectroscopy allows us to clearly correlate the observed changes of excitonic emission with the increased levels of lattice disorder and defects. Overall, the EBE process results in the lowest level of doping and defect densities and preserves the spectral weight of the exciton emission in the PL, as well as the exciton oscillator strength. Encapsulation with ALD appears to cause chemical changes, which makes it distinct from all other techniques. Sputtering is revealed as the most aggressive deposition method for WS$_2$, fully quenching its optical response. Our results demonstrate and quantify the effects of direct deposition of dielectric materials onto monolayer WS$_2$, which can provide a valuable guidance for the efforts to integrate monolayer TMDCs into functional optoelectronic devices.
The epitaxy of MoO2 on c_plane sapphire substrates is examined. A theoretical approach, based on density functional theory calculations of the strain energy, allowed to predict the preferred layer/substrate epitaxial relationships. To test the results of these calculations, MoO2/(001) Al2O3 heterostructures were grown using the chemically_driven isothermal close space vapour transport technique. At the early stages of the growth, two kinds of morphologies were obtained, using the same growth parameters: lying and standing flakes. The composition and morphology, as well as the layer/substrate epitaxial relationships were determined for both kind of morphologies. Experimental epitaxial relationships coincide with those predicted by DFT calculation as the most favourable ones in terms of strain energy. For thicker films, the standing flakes evolve to form an epitaxial porous layer composed by coalesced epitaxial flakes. The interfacial strain between the sapphire substrate and MoO2 enables a self_organization from nanometer to micron scales between separated or coalesced flakes, depending on deposition condition.
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