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Au-Ge alloys for wide-range low-temperature on-chip thermometry

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 Added by James Dann
 Publication date 2019
  fields Physics
and research's language is English




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We present results of a Au-Ge alloy that is useful as a resistance-based thermometer from room temperature down to at least SI{0.2}{kelvin}. Over a wide range, the electrical resistivity of the alloy shows a logarithmic temperature dependence, which simultaneously retains the sensitivity required for practical thermometry while also maintaining a relatively modest and easily-measurable value of resistivity. We characterize the sensitivity of the alloy as a possible thermometer and show that it compares favorably to commercially-available temperature sensors. We experimentally identify that the characteristic logarithmic temperature dependence of the alloy stems from Kondo-like behavior induced by the specific heat treatment it undergoes.

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The electronic properties of thin metallic films deviate from the corresponding bulk ones when the film thickness is comparable with the wavelength of the electrons at the Fermi level due to quantum size effects (QSE). QSE are expected to affect the film morphology and structure leading to the low temperature (LT) ``electronic growth of metals on semiconductors. In particular, layer-by-layer growth of Pb(111) films has been reported for deposition on Ge(001) below 130 K. An extremely flat morphology is preserved throughout deposition from four up to a dozen of monolayers. These flat films are shown to be metastable and to reorganize into large clusters uncovering the first Pb layer, pseudomorphic to the substrate, already at room temperature. Indications of QSE induced structural variations of the growing films have been reported for Pb growth on Ge(001), where the apparent height of the Pb(111) monatomic step was shown to change in an oscillatory fashion by He atom scattering (HAS) during layer-by-layer growth. The extent of the structural QSE has been obtained by a comparison of the HAS data with X-ray diffraction (XRD) and reflectivity experiments. Whereas step height variations as large as 20 % have been measured by HAS reflectivity, the displacement of the atomic planes from their bulk position, as measured by XRD, has been found to mainly affect the topmost Pb layer, but with a lower extent, i.e. the QSE observed by HAS are mainly due to a perpendicular displacement of the topmost layer charge density. The effect of the variable surface relaxation on the surface vibration has been studied by inelastic HAS to measure the acoustic dispersion of the low energy phonons.
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