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Register a new userGate Tunable Magneto-resistance of Ultra-Thin WTe2 Devices
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In this work, the magneto-resistance (MR) of ultra-thin WTe2/BN heterostructures far away from electron-hole equilibrium is measured. The change of MR of such devices is found to be determined largely by a single tunable parameter, i.e. the amount of imbalance between electrons and holes. We also found that the magnetoresistive behavior of ultra-thin WTe2 devices is well-captured by a two-fluid model. According to the model, the change of MR could be as large as 400,000%, the largest potential change of MR among all materials known, if the ultra-thin samples are tuned to neutrality when preserving the mobility of 167,000 cm2V-1s-1 observed in bulk samples. Our findings show the prospects of ultra-thin WTe2 as a variable magnetoresistance material in future applications such as magnetic field sensors, information storage and extraction devices, and galvanic isolators. The results also provide important insight into the electronic structure and the origin of the large MR in ultra-thin WTe2 samples.
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We report on detailed room temperature and low temperature transport properties of double-gate Si MOSFETs with the Si well thickness in the range 7-17 nm. The devices were fabricated on silicon-on-insulator wafers utilizing wafer bonding, which enabled us to use heavily doped metallic back gate. We observe mobility enhancement effects at symmetric gate bias at room temperature, which is the finger print of the volume inversion/accumulation effect. An asymmetry in the mobility is detected at 300 K and at 1.6 K between the top and back interfaces of the Si well, which is interpreted to arise from different surface roughnesses of the interfaces. Low temperature peak mobilities of the reported devices scale monotonically with Si well thickness and the maximum low temperature mobility was 1.9 m2/Vs, which was measured from a 16.5 nm thick device. In the magneto transport data we observe single and two sub-band Landau level filling factor behavior depending on the well thickness and gate biasing.
The observation of the electrically tunable and highly confined plasmons in graphene has stimulated the exploration of interesting properties of plasmons in other two dimensional materials. Recently, hyperbolic plasmon resonance modes are observed in exfoliated WTe2 films, a type-II Weyl semimetal with layered structure, providing a platform for the assembly of plasmons with hyperbolicity and exotic topological properties. However, the plasmon modes were observed in relatively thick and small-area films, which restrict the tunability and application for plasmons. Here, large-area (~ cm) WTe2 films with different thickness are grown by chemical vapor deposition method, in which plasmon resonance modes are observed in films with different thickness down to about 8 nm. Hybridization of plasmon and surface polar phonons of the substrate is revealed by mapping the plasmon dispersion. The plasmon frequency is demonstrated to be tunable by changing the temperature and film thickness. Our results facilitate the development of a tunable and scalable WTe2 plasmonic system for revealing topological properties and towards various applications in sensing, imaging and light modulation.
Hybrid semiconductor-superconductor InAs-Al nanowires with uniform and defect-free crystal interfaces are one of the most promising candidates used in the quest for Majorana zero modes (MZMs). However, InAs nanowires often exhibit a high density of randomly distributed twin defects and stacking faults, which result in an uncontrolled and non-uniform InAs-Al interface. Furthermore, this type of disorder can create potential inhomogeneity in the wire, destroy the topological gap, and form trivial sub-gap states mimicking MZM in transport experiments. Further study shows that reducing the InAs nanowire diameter from growth can significantly suppress the formation of these defects and stacking faults. Here, we demonstrate the in situ growth of ultra-thin InAs nanowires with epitaxial Al film by molecular-beam epitaxy. Our InAs diameter (~ 30 nm) is only one-third of the diameters (~ 100 nm) commonly used in literatures. The ultra-thin InAs nanowires are pure phase crystals for various different growth directions, suggesting a low level of disorder. Transmission electron microscopy confirms an atomically sharp and uniform interface between the Al shell and the InAs wire. Quantum transport study on these devices resolves a hard induced superconducting gap and $2e^-$ periodic Coulomb blockade at zero magnetic field, a necessary step for future MZM experiments. A large zero bias conductance peak with a peak height reaching 80% of $2e^2/h$ is observed.
Broken symmetry is the essence of exotic properties in condensed matters. Tungsten ditelluride, WTe$_2$, exceptionally takes a non-centrosymmetric crystal structure in the family of transition metal dichalcogenides, and exhibits novel properties$^{1-4}$, such as the nonsaturating magnetoresistance$^1$ and ferroelectric-like behavior$^4$. Herein, using the first-principles calculation, we show that unique layer stacking in WTe$_2$ generates surface dipoles with different strengths on the top and bottom surfaces in few-layer WTe$_2$. This leads to a layer-dependence for electron/hole carrier ratio and the carrier compensation responsible for the unusual magnetoresistance. The surface dipoles are tunable and switchable using the interlayer shear displacement. This could explain the ferroelectric-like behavior recently observed in atomically thin WTe$_2$ films$^4$. In addition, we reveal that exfoliation of the surface layer flips the out-of-plane spin textures. The presented results will aid in the deeper understanding, manipulation, and further exploration of the physical properties of WTe$_2$ and related atom-layered materials, for applications in electronics and spintronic devices.
A quantum spin hall insulator(QSHI) is manifested by its conducting edge channels that originate from the nontrivial topology of the insulating bulk states. Monolayer 1T-WTe2 exhibits this quantized edge conductance in transport measurements, but because of its semimetallic nature, the coherence length is restricted to around 100 nm. To overcome this restriction, we propose a strain engineering technique to tune the electronic structure, where either a compressive strain along a axis or a tensile strain along b axis can drive 1T-WTe2 into an full gap insulating phase. A combined study of molecular beam epitaxy and in-situ scanning tunneling microscopy/spectroscopy then confirmed such a phase transition. Meanwhile, the topological edge states were found to be very robust in the presence of strain.
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