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Induced robust topological order on an ordinary insulator hetero-structured with a strong topological insulator

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 Added by Maohai Xie Prof.
 Publication date 2016
  fields Physics
and research's language is English




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Topological states of matter originate from distinct topological electronic structures of materials. As for strong topological insulators (STIs), the topological surface (interface) is a direct consequence of electronic structure transition between materials categorized to different topological genus. Therefore, it is fundamentally interesting if such topological character can be manipulated. Besides tuning the crystal field and the strength of spin-orbital coupling (e.g., by external strain, or chemical doping), there is currently rare report on topological state induced in ordinary insulators (OIs) by the heterostructure of OI/STI. Here we report the observation of a Dirac cone topological surface state (TSS) induced on the Sb2Se3 layer up to 15 nm thick in the OI/STI heterostructure, in sharp contrast with the OI/OI heterostructure where no sign of TSS can be observed. This is evident for an induced topological state in an OI by heterostructure.

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A topological insulator (TI) interfaced with a magnetic insulator (MI) may host an anomalous Hall effect (AHE), a quantum AHE, and a topological Hall effect (THE). Recent studies, however, suggest that coexisting magnetic phases in TI/MI heterostructures may result in an AHE-associated response that resembles a THE but in fact is not. This article reports a genuine THE in a TI/MI structure that has only one magnetic phase. The structure shows a THE in the temperature range of T=2-3 K and an AHE at T=80-300 K. Over T=3-80 K, the two effects coexist but show opposite temperature dependencies. Control measurements, calculations, and simulations together suggest that the observed THE originates from skyrmions, rather than the coexistence of two AHE responses. The skyrmions are formed due to an interfacial DMI interaction. The DMI strength estimated is substantially higher than that in heavy metal-based systems.
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