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Register a new userDirect observation of the thickness distribution of ultra thin AlOx barrier in Al/AlOx/Al Josephson junctions
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We show that less than 10% of the barrier area dominates the electron tunneling in state-of-art Al/AlOx/Al Josephson junctions. They have been studied by transmission electron microscopy, specifically using atomic resolution annular dark field (ADF) scanning transmission electron microscopy (STEM) imaging. The direct observation of the local barrier thickness shows a Gaussian distribution of the barrier thickness variation along the junction, from ~1 nm to ~2 nm in the three junctions we studied. We have investigated how the thickness distribution varies with oxygen pressure (po) and oxidation time (to) and we find, in agreement with resistance measurements on similar junctions, that an increased to gives a thicker barrier than an increased po.
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The structural and nanochemical properties of thin $AlO_x$ layers are decisive for the performance of advanced electronic devices. For example, they are frequently used as tunnel barriers in Josephson junction-based superconducting devices. However, systematic studies of the influence of oxidation parameters on structural and nanochemical properties are rare up to now, as most studies focus on the electrical properties of $AlO_x$ layers. This study aims to close this gap by applying transmission electron microscopy in combination with electron energy loss spectroscopy to analyze the structural and nanochemical properties of differently fabricated $AlO_x$ layers and correlate them with fabrication parameters. With respect to the application of $AlO_x$ as tunnel barrier in superconducting Josephson junctions, $Al/AlO_x/Al$-layer systems were deposited on Si substrates. We will show that the oxygen content and structure of amorphous $AlO_x$ layers is strongly dependent on the fabrication process and oxidation parameters. Dynamic and static oxidation of Al yields oxygen-deficient amorphous $AlO_x$ layers, where the oxygen content ranges from x = 0.5 to x = 1.3 depending on oxygen pressure and substrate temperature. Thicker layers of stoichiometric crystalline $gamma-Al_2O_3$ layers were grown by electron-beam evaporation of $Al_2O_3$ and reactive sputter deposition.
We report that an ultra-thin, post-oxidized aluminum epilayer grown on the AlGaAs surface works as a high-quality tunnel barrier for spin injection from a ferromagnetic metal to a semiconductor. One of the key points of the present oxidation method is the formation of the crystalline AlOx template layer without oxidizing the AlGaAs region near the Al/AlGaAs interface. The oxidized Al layer is not amorphous but show well-defined single crystalline feature reminiscent of the spinel gamma-AlOx phase. A spin-LED consisting of an Fe layer, a crystalline AlOx barrier layer, and an AlGaAs-InGaAs double hetero-structure has exhibited circularly polarized electroluminescence with circular polarization of P_{EL} = 0.145 at the remnant magnetization state of the Fe layer, indicating the relatively high spin injection efficiency (epsilon = 2P_{EL} / P_{Fe}) of 0.63.
In a standard Josephson junction the current is zero when the phase difference between the superconducting leads is zero. This condition is protected by parity and time-reversal symmetries. However, the combined presence of spin-orbit coupling and magnetic field breaks these symmetries and can lead to a finite supercurrent even when the phase difference is zero. This is the so called anomalous Josephson effect -- the hallmark effect of superconducting spintronics --and can be characterized by the corresponding anomalous phase shift ($phi_0$). We report the observation of a tunable anomalous Josephson effect in InAs/Al Josephson junctions measured via a superconducting quantum interference device (SQUID). By gate controlling the density of InAs we are able to tune the spin-orbit coupling of the Josephson junction by more than one order of magnitude. This gives us the ability to tune $phi_0$, and opens several new opportunities for superconducting spintronics, and new possibilities for realizing and characterizing topological superconductivity.
We have probed the superconducting proximity effect through long high-quality monocrystalline Ag nanowires, by realizing Josephson junctions of different lengths, with different superconducting materials. Thanks to the high number of junctions probed, both the contact resistance and electron diffusion constant could be determined, enabling a comparison of the measured critical current to theoretical expectation, over the entire regime from short to long diffusive junction. Although the length dependence of the critical current is as expected, the amplitude of the $R_{N}I_c$ product is smaller than predicted by theory. We also address the magnetic field dependence of the critical current. The quasi-gaussian decay of the critical current with field expected of a long narrow junction is observed for all superconducting contacts we used except for aluminum. We present the striking non-monotonous effect of field on the critical current of junctions with aluminum contacts, and analyze it in terms of improved quasiparticle thermalization by a magnetic field.
We investigated current-voltage characteristics of unshunted and externally shunted Josephson junctions (JJs) with high critical current densities, Jc, in order to extract their basic parameters and statistical characteristics for JJ modeling in superconducting integrated circuits and to assess their potential for future technology nodes. Nb/AlOx-Al/Nb JJs with diameters from 0.5 {mu}m to 6 {mu}m were fabricated using a fully planarized process with Mo or MoNx thin-film shunt resistors with sheet resistance Rsq = 2 {Omega}/sq and Rsq = 6 {Omega}/sq, respectively. We used our standard MIT LL process SFQ5ee to fabricate JJs with Jc = 0.1 mA/{mu}m^2 and our new process SFQ5hs to make JJs with Jc = 0.2 mA/{mu}m^2 and higher current densities up to about 1 mA/{mu}m^2. Using LRC resonance features on the I-V characteristics of shunted JJs, we extract the inductance associated with molybdenum shunt resistors of 1.4 pH/sq. The main part this inductance, about 1.1 pH/sq, is the inductance of the 40-nm Mo resistor film, while the geometrical inductance of superconducting Nb wiring contributes the rest. We attribute this large inductance to kinetic inductance arising from the complex conductivity of a thin normal-metal film in an electromagnetic field with angular frequency {omega}, {sigma}({omega})={sigma}0/(1+i{omega}{tau}), where {sigma}0 is the static conductivity and {tau} the electron scattering time. Using a resonance in a large-area unshunted high-Jc junction excited by a resistively coupled small-area shunted JJ, we extract the Josephson plasma frequency and specific capacitance of high-Jc junctions in 0.1 to 1 mA/{mu}m^2 Jc range. We also present data on Jc targeting and JJ critical current spreads. We discuss using 0.2-mA/{mu}m^2 JJs in VLSI Single Flux Quantum circuits and 0.5-mA/{mu}m^2 JJs in high-density integrated circuits without shunt resistors.
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