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Register a new userCoherence properties of focused X-ray beams at high brilliance synchrotron sources
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An analytical approach describing properties of focused partially coherent X-ray beams is presented. The method is based on the results of statistical optics and gives both the beam size and transverse coherence length at any distance behind an optical element. In particular, here we consider Gaussian Schell-model beams and thin optical elements. Limiting cases of incoherent and fully coherent illumination of the focusing element are discussed. The effect of the beam defining aperture, typically used in combination with focusing elements at synchrotron sources to improve transverse coherence, is also analyzed in detail. As an example the coherence properties in the focal region of compound refractive lenses at the PETRA III synchrotron source are analyzed.
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A general theoretical approach based on the results of statistical optics is used for the analysis of the transverse coherence properties of 3-rd generation synchrotron sources and x-ray free-electron lasers (XFEL). Correlation properties of the wavefields are calculated at different distances from an equivalent Gaussian Schell-model source. This model is used to describe coherence properties of the five meter undulator source at the synchrotron storage ring PETRA III. In the case of XFEL sources the decomposition of the statistical fields into a sum of independently propagating transverse modes is used for the analysis of the coherence properties of these new sources. A detailed calculation is performed for the parameters of the SASE1 undulator at the European XFEL. It is demonstrated that only a few modes contribute significantly to the total radiation field of that source.
We discuss the properties of pure multipole beams with well-defined handedness or helicity, with the beam field a simultaneous eigenvector of the squared total angular momentum and its projection along the propagation axis. Under the condition of hemispherical illumination, we show that the only possible propagating multipole beams are `sectoral multipoles. The sectoral dipole beam is shown to be equivalent to the non-singular time-reversed field of an electric and a magnetic point dipole Huygens source located at the beam focus. Higher order multipolar beams are vortex beams vanishing on the propagation axis. The simple analytical expressions of the electric field of sectoral multipole beams, exact solutions of Maxwells equations, and the peculiar behaviour of the Poynting vector and spin and orbital angular momenta in the focal volume could help to understand and model light-matter interactions under strongly focused beams.
We demonstrate X-ray phase contrast microscopy performed at the European X-ray Free-Electron Laser sampled at 1.128 MHz rate. We have applied this method to image stochastic processes induced by an optical laser incident on water-filled capillaries with micrometer scale spatial resolution. The generated high speed water jet, cavitation formation and annihilation in water and glass, as well as glass explosions are observed. The comparison between XFEL and previous synchrotron MHz microscopy shows the superior contrast and spatial resolution at the XFEL over the synchrotron. This work opens up new possibilities for the characterization of dynamic stochastic systems on nanosecond to microsecond time scales at megahertz rate with object velocities up to few kilometers per second using X-ray Free-Electron Laser sources.
We report on the generation of a narrow divergence ($thetaapprox 2.5$ mrad), multi-MeV ($E_text{MAX} = 18$ MeV) and ultra-high brilliance ($approx 2times10^{19}$ photons s$^{-1}$ mm$^{-2}$ mrad $^{-2}$ 0.1% BW) $gamma$-ray beam from the scattering of an ultra-relativistic laser-wakefield accelerated electron beam in the field of a relativistically intense laser (dimensionless amplitude $a_0approx2$). The spectrum of the generated $gamma$-ray beam is measured, with MeV resolution, seamlessly from 6 MeV to 18 MeV, giving clear evidence of the onset of non-linear Thomson scattering. The photon source has the highest brilliance in the multi-MeV regime ever reported in the literature.
Graphene plasmons are of remarkable features that make graphene plasmon elements promising for applications to integrated photonic devices. The fabrication of graphene plasmon components and control over plasmon propagating are of fundamental important. Through near-field plasmon imaging, we demonstrate controllable modifying of the reflection of graphene plasmon at boundaries etched by ion beams. Moreover, by varying ion dose at a proper value, nature like reflection boundary can be obtained. We also investigate the influence of ion beam incident angle on plasmon reflection. To illustrate the application of ion beam etching, a simple graphene wedge-shape plasmon structure is fabricated and performs excellently, proving this technology as a simple and efficient tool for controlling graphene plasmons.
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