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Register a new userEx-situ Tunnel Junction Process Technique Characterized by Coulomb Blockade Thermometry
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We investigate a wafer scale tunnel junction fabrication method, where a plasma etched via through a dielectric layer covering bottom Al electrode defines the tunnel junction area. The ex-situ tunnel barrier is formed by oxidation of the bottom electrode in the junction area. Room temperature resistance mapping over a 150 mm wafer give local deviation values of the tunnel junction resistance that fall below 7.5 % with an average of 1.3 %. The deviation is further investigated by sub-1 K measurements of a device, which has one tunnel junction connected to four arrays consisting of N junctions (N = 41, junction diameter 700 nm). The differential conductance is measured in single-junction and array Coulomb blockade thermometer operation modes. By fitting the experimental data to the theoretical models we found an upper limit for the local tunnel junction resistance deviation of ~5 % for the array of 2N+1 junctions. This value is of the same order as the minimum detectable deviation defined by the accuracy of our experimental setup.
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We consider a tunnel junction formed between a fixed electrode and an oscillating one. Accumulation of the charge on the junction capacitor induces a force on the nano-mechanical oscillator. The junction is voltage biased and connected in series with an impedance $Z(omega)$. We discuss how the picture of Coulomb blockade is modified by the presence of the oscillator. Quantum fluctuations of the mechanical oscillator modify the $I$-$V$ characteristics particularly in the strong Coulomb blockade limit. We show that the oscillator can be taken into account by a simple modification of the effective impedance of the circuit. We discuss in some details the case of a single inductance $Z(omega)=iLomega$ and of a constant resistance $Z(omega)=R$. With little modifications the theory applies also to incoherent transport in Josephson junctions in the tunneling limit.
We have numerically studied the behavior of one dimensional tunnel junction arrays when random background charges are included using the ``orthodox theory of single electron tunneling. Random background charge distributions are verified in both amplitude and density. The use of a uniform array as a transistor is discussed both with and without random background charges. An analytic expression for the gain near zero gate voltage in a uniform array with no background charges is derived. The gate modulation with background charges present is simulated.
We study the tunneling magneto thermo power (TMTP) in CoFeB/MgO/CoFeB magnetic tunnel junction nanopillars. Thermal gradients across the junctions are generated by a micropatterned electric heater line. Thermo power voltages up to a few tens of muV between the top and bottom contact of the nanopillars are measured which scale linearly with the applied heating power and hence with the applied temperature gradient. The thermo power signal varies by up to 10 muV upon reversal of the relative magnetic configuration of the two CoFeB layers from parallel to antiparallel. This signal change corresponds to a large spin-dependent Seebeck coefficient of the order of 100 muV/K and a large TMTP change of the tunnel junction of up to 90%.
The charge localization of single electrons on mesoscopic metallic islands leads to a suppression of the electrical current, known as the Coulomb blockade. When this correction is small, it enables primary electron thermometry, as it was first demonstrated by Pekola et al. (Phys. Rev. Letters, 73, 2903 [1994]). However, in the low temperature limit, random charge offsets influence the conductance and limit the universal behavior of a single metallic island. In this work, we numerically investigate the conductance of a junction array, and demonstrate the extension of the primary regime for large arrays, even when the variations in the device parameters are taken into account. We find that our simulations agree well with measured conductance traces in the submillikelvin electron temperature regime.
We show that direct current in a tantalum microstrip can induce steady-state magnetic oscillations in an adjacent nanomagnet through spin torque from the spin Hall effect (SHE). The oscillations are detected electrically via a magnetic tunnel junction (MTJ) contacting the nanomagnet. The oscillation frequency can be controlled using the MTJ bias to tune the magnetic anisotropy. In this 3-terminal device the SHE torque and the MTJ bias therefore provide independent controls of the oscillation amplitude and frequency, enabling new approaches for developing tunable spin torque nano-oscillators.
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