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Emittance exchange beamlines employ transverse masks to create drive and witness beams of variable longitudinal profile and bunch spacing. Recently, this approach has been used to create advanced driver profiles and demonstrate record-breaking plasma wakefield transformer ratios [Roussel, R., et al., Phys. Rev. Lett. 124, 044802 (2020)], a crucial advancement for efficient witness acceleration. However, since the transverse masks are individually laser cut and installed into the UHV beamline, refinement of the beam profiles is not possible without replacing masks. Instead, this work proposes the use of a UHV compatible multileaf collimator as a beam mask. Such a device permits real-time adjustment of the electron distribution, permitting greater refinement in a manner highly synergistic with machine learning. Beam dynamics simulations have shown that a practically realizable multileaf collimator can offer resolution that is functionally equivalent to that offered by laser cut masks.
Ionization injection triggered by short wavelength laser pulses inside a nonlinear wakefield driven by a longer wavelength laser is examined via multi-dimensional particle-in-cell simulations. We find that very bright electron beams can be generated
We investigate beam loading and emittance preservation for a high-charge electron beam being accelerated in quasi-linear plasma wakefields driven by a short proton beam. The structure of the studied wakefields are similar to those of a long, modulate
Full exploitation of emittance exchange (EEX) requires aberration-free performance of a complex imaging system including active radio-frequency (RF) elements which can add temporal distortions. We investigate the performance of an EEX line where the
An active plasma lens focuses the beam in both the horizontal and vertical planes simultaneously using a magnetic field generated by a discharge current through the plasma. A beam size of 5--10 $mu$m can be achieved using an focusing gradient on the
A system for online measurement of the transverse beam emittance was developed. It is named $^{4}$PrOB$varepsilon$aM (4-Profiler Online Beam Emittance Measurement) and was conceived to measure the emittance in a fast and efficient way using the multi