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Thin transition metal dichalcogenides sustain superconductivity at large in-plane magnetic fields due to Ising spin-orbit protection, which locks their spins in an out-of-plane orientation. Here we use thin NbSe$_2$ as superconducting electrodes laterally coupled to graphene, making a planar, all van der Waals two-dimensional Josephson junction (2DJJ). We map out the behavior of these novel devices with respect to temperature, gate voltage, and both out-of-plane and in-plane magnetic fields. Notably, the 2DJJs sustain supercurrent up to $H_parallel$ as high as 8.5 T, where the Zeeman energy $E_Z$ rivals the Thouless energy $E_{Th}$, a regime hitherto inaccessible in graphene. As the parallel magnetic field $H_parallel$ increases, the 2DJJs critical current is suppressed and in a few cases undergoes suppression and recovery. We explore the behavior in $H_parallel$ by considering theoretically two effects: a 0-$pi$ transition induced by tuning of the Zeeman energy and the unique effect of ripples in an atomically thin layer which create a small spatially varying perpendicular component of the field. The 2DJJs have potential utility as flexible probes for two-dimensional superconductivity in a variety of materials and introduce high $H_parallel$ as a newly accessible experimental knob.
Josephson junctions based on three-dimensional topological insulators offer intriguing possibilities to realize unconventional $p$-wave pairing and Majorana modes. Here, we provide a detailed study of the effect of a uniform magnetization in the norm
We have theoretically studied the supercurrent profiles in three-dimensional normal metal and ferromagnetic Josephson configurations, where the magnitude of the superconducting gaps in the superconducting leads are unequal, i.e., $Delta_1 eq Delta_2$
We present results on all-MgB2 tunnel junctions, where the tunnel barrier is deposited MgO or native-oxide of base electrode. For the junctions with MgO, the hysteretic I-V curve resembles a conventional underdamped Josephson junction characteristic
We combine electron beam lithography and masked anodization of epitaxial aluminium to define tunnel junctions via selective oxidation, alleviating the need for wet-etch processing or direct deposition of dielectric materials. Applying this technique
Graphene on silicon carbide (SiC) has proved to be highly successful in Hall conductance quantization for its homogeneity at the centimetre scale. Robust Josephson coupling has been measured in co-planar diffusive Al/monololayer graphene/Al junctions