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Plasmonic color printing with semicontinuous metal films is a lithography-free, non-fading, and environment-friendly method of generation of bright colors. Such films are comprised of metal nanoparticles, which resonate at different wavelengths upon light illumination depending on the size and shape of the nanoparticles. To achieve an experimentally demonstrated structure that was optimized in terms of broader color range and increased stability, variable Ag semicontinuous metal films were deposited on a metallic mirror with a sub-wavelength-thick dielectric spacer. Femtosecond laser post-processing was then introduced to extend the color gamut through spectrally induced changes from blue to green, red, and yellow. Long-term stability and durability of the structures were addressed to enable non-fading colors with an optimized overcoating dielectric layer. The thickness of the proposed designs is on the order of 100 nanometers, and it can be deposited on any substrate. These structures generate a broad range of long-lasting colors in reflection that can be applied to real-life artistic or technological applications with a spatial resolution on the order of 0.3 mm or less.
Thin coatings of Chromium oxide have been used for applications as absorbing material in solar cells, as protections for magnetic data recording devices and as shields in flexible solar cells. Thin coatings of pure chromium were vacuum deposited on a
We present a new approach to femtosecond direct laser writing lithography to pattern nanocavities in ferromagnetic thin films. To demonstrate the concept we irradiated 300~nm thin nickel films by single intense femtosecond laser pulses through the gl
We report the first experimental observation of non-adiabatic field-free orientation of a heteronuclear diatomic molecule (CO) induced by an intense two-color (800 and 400 nm) femtosecond laser field. We monitor orientation by measuring fragment ion
We introduce a novel nanofabrication technique to directly deposit catalyst pads for the chemical vapor deposition synthesis of single-walled carbon nanotubes (SWCNTs) at any desired position on a substrate by Gallium focused ion beam (FIB) induced d
We describe an all-optical lithography process that can be used to make electrical contact to atomic-precision donor devices made in silicon using scanning tunneling microscopy (STM). This is accomplished by implementing a cleaning procedure in the S