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A large bulk band gap is critical for the applications of quantum spin hall (QSH) insulators in spintronics at room temperature. Based on first-principles calculations, we predict that the methyl-functionalized III-Bi monolayers, namely III-Bi-(CH3)2 (III=Ga, In, Tl) thin films, own QSH states with band gap as large as 0.260, 0.304 and 0.843 eV, respectively, making them suitable for room-temperature applications. The topological characteristics are confirmed by s-px,y band inversion, topological invariant Z2, and the topologically protected edge states. Noticeably, for GaBi/InBi-(CH3)2 films, the s-px,y band inversion occurred in the progress of spin-orbital coupling (SOC), while for TlBi(CH3)2 film, the s-px,y band inversion happened in the progress of chemical bonding. Significantly, the QSH states in III-Bi-(CH3)2 films are robust against the mechanical strains and various methyl coverages, making these films particularly flexible to substrate choice for device applications. Besides, the h-BN substrate is an ideal substrate for III-Bi-(CH3)2 films to realize large gap nontrivial topological states.. These findings demonstrate that the methyl-functionalized III-Bi films may be good QSH effect platforms for topological electronic devices design and fabrication in spintronics.
The search of large-gap quantum spin Hall (QSH) insulators and effective approaches to tune QSH states is important for both fundamental and practical interests. Based on first-principles calculations we find two-dimensional tin films are QSH insulat
Large bulk band gap is critical for application of the quantum spin Hall (QSH) insulator or two dimensional (2D) topological insulator (TI) in spintronic device operating at room temperature (RT). Based on the first-principles calculations, here we p
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