ترغب بنشر مسار تعليمي؟ اضغط هنا

Infrared Transmissometer to Measure the Thickness of NbN Thin Films

59   0   0.0 ( 0 )
 نشر من قبل Kristen Sunter
 تاريخ النشر 2015
  مجال البحث فيزياء
والبحث باللغة English




اسأل ChatGPT حول البحث

We present an optical setup that can be used to characterize the thicknesses of thin NbN films to screen samples for fabrication and to better model the performance of the resulting superconducting nanowire single photon detectors. The infrared transmissometer reported here is easy to use, gives results within minutes and is non-destructive. Thus, the thickness measurement can be easily integrated into the workflow of deposition and characterization. Comparison to a similar visible-wavelength transmissometer is provided.

قيم البحث

اقرأ أيضاً

We have implemented three different optical methods to quantitatively assess the thickness of thin GaSe flakes transferred on both transparent substrates, like Gel-Film, or SiO2/Si substrates. We show how their apparent color can be an efficient way to make a quick rough estimation of the thickness of the flakes. This method is more effective for SiO2/Si substrates as the thickness dependent color change is more pronounced on these substrates than on transparent substrates. On the other hand, for transparent substrates, the transmittance of the flakes in the blue region of the visible spectrum can be used to estimate the thickness. We find that the transmittance of flakes in the blue part of the spectrum decreases at a rate of 1.2%/nm. On SiO2/Si, the thickness of the flakes can be accurately determined by fitting optical contrast spectra to a Fresnel law-based model. Finally, we also show how the quantitative analysis of transmission mode optical microscopy images can be a powerful method to quickly probe the environmental degradation of GaSe flakes exposed to aging conditions.
In spectroscopic ellipsometry, the optical properties of materials are obtained indirectly by generally assuming dielectric function and optical models. This ellipsometry analysis, which typically requires numerous model parameters, has essentially b een performed by a try-and-error approach, making this method as a rather time-consuming characterization technique. Here, we propose a fully automated spectroscopic ellipsometry analysis method, which can be applied to obtain dielectric functions of light absorbing materials in a full measured energy range without any prior knowledge of model parameters. The developed method consists of a multiple-step grid search and the following non-linear regression analysis. Specifically, in our approach, the analyzed spectral region is gradually expanded toward higher energy while incorporating an additional optical transition peak whenever the root-mean-square error of the fitting analysis exceeds a critical value. In particular, we have established a unique algorithm that could be employed for the ellipsometry analyses of different types of optical materials. The proposed scheme has been applied successfully for the analyses of MoOx transparent oxides and the complex dielectric function of a MoOx layer that exhibits dual optical transitions due to band-edge and deep-level absorptions has been determined. The developed method can drastically reduce a time necessary for an ellipsometry analysis, eliminating a serious drawback of a traditional spectroscopic ellipsometry analysis method.
301 - Yuchen Ji , Zheng Liu , Peng Zhang 2021
The quantized version of anomalous Hall effect realized in magnetic topological insulators (MTIs) has great potential for the development of topological quantum physics and low-power electronic/spintronic applications. To enable dissipationless chira l edge conduction at zero magnetic field, effective exchange field arisen from the aligned magnetic dopants needs to be large enough to yield specific spin sub-band configurations. Here we report the thickness-tailored quantum anomalous Hall (QAH) effect in Cr-doped (Bi,Sb)2Te3 thin films by tuning the system across the two-dimensional (2D) limit. In addition to the Chern number-related metal-to-insulator QAH phase transition, we also demonstrate that the induced hybridization gap plays an indispensable role in determining the ground magnetic state of the MTIs, namely the spontaneous magnetization owning to considerable Van Vleck spin susceptibility guarantees the zero-field QAH state with unitary scaling law in thick samples, while the quantization of the Hall conductance can only be achieved with the assistance of external magnetic fields in ultra-thin films. The modulation of topology and magnetism through structural engineering may provide a useful guidance for the pursuit of QAH-based new phase diagrams and functionalities.
We have studied the effect of deposition rate and layer thickness on the properties of epitaxial MgB2 thin films grown by hybrid physical-chemical vapor deposition on 4H-SiC substrates. The MgB2 film deposition rate depends linearly on the concentrat ion of B2H6 in the inlet gas mixture. We found that the superconducting and normal-state properties of the MgB2 films are determined by the film thickness, not by the deposition rate. When the film thickness was increased, the transition temperature, Tc, increased and the residual resistivity, rho0, decreased. Above about 300 nm, a Tc of 41.8 K, a rho0 of 0.28 mikroOhm.cm, and a residual resistance ratio RRR of over 30 were obtained. These values represent the best MgB2 properties reported thus far.
We use real-time reflection high energy electron diffraction intensity oscillation to establish the Te-rich growth dynamics of topological insulator thin films of Bi2Te3 on Si(111) substrate by molecular beam epitaxy. In situ angle resolved photoemis sion spectroscopy (ARPES), scanning tunneling microscopy and ex situ transport measurements reveal that the as-grown Bi2Te3 films without any doping are an intrinsic topological insulator with its Fermi level intersecting only the metallic surface states. Experimentally, we find that the single-Dirac-cone surface state develops at a thickness of two quintuple layers (2 QL). Theoretically, we show that the interaction between the surface states from both sides of the film, which is determined by the penetration depth of the topological surface state wavefunctions, sets this lower thickness limit.
التعليقات
جاري جلب التعليقات جاري جلب التعليقات
سجل دخول لتتمكن من متابعة معايير البحث التي قمت باختيارها
mircosoft-partner

هل ترغب بارسال اشعارات عن اخر التحديثات في شمرا-اكاديميا