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تسجيل مستخدم جديدElectron Beam Ion Sources
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نشر من قبل
Scientific Information Service CERN
تاريخ النشر
2014
مجال البحث
فيزياء
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English
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Electron beam ion sources (EBISs) are ion sources that work based on the principle of electron impact ionization, allowing the production of very highly charged ions. The ions produced can be extracted as a DC ion beam as well as ion pulses of different time structures. In comparison to most of the other known ion sources, EBISs feature ion beams with very good beam emittances and a low energy spread. Furthermore, EBISs are excellent sources of photons (X-rays, ultraviolet, extreme ultraviolet, visible light) from highly charged ions. This chapter gives an overview of EBIS physics, the principle of operation, and the known technical solutions. Using examples, the performance of EBISs as well as their applications in various fields of basic research, technology and medicine are discussed.
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This chapter provides an overview of the basic requirements for ion sources designed and operated in radioactive ion beam facilities. The facilities where these sources are operated exploit the isotope separation online (ISOL) technique, in which a t
arget is combined with an ion source to maximize the secondary beam intensity and chemical element selectivity. Three main classes of sources are operated, namely surface-type ion sources, arc discharge-type ion sources, and finally radio-frequency-heated plasma-type ion sources.
The particle-in-cell MCC code NAM-ECRIS is used to simulate the ECRIS plasma sustained in a mixture of Kr with O2, N2, Ar, Ne and He. The model assumes that ions are electrostatically confined in ECR zone by a dip in the plasma potential. Gain in the
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