Monolayer transition metal dichalcogenides are promising materials for photoelectronic devices. Among them, molybdenum disulphide (MoS$_2$) and tungsten disulphide (WS$_2$) are some of the best candidates due to their favorable band gap values and ba
nd edge alignments. Here we consider various perturbative corrections to the DFT electronic structure, e.g. GW, spin-orbit coupling, as well as many-body excitonic and trionic effects, and calculate accurate band gaps as a function of homogeneous strain in these materials. We show that all of these corrections are of comparable magnitudes and need to be included in order to obtain an accurate electronic structure. We calculate the strain at which the direct-to-indirect gap transition occurs. After considering all contributions, the direct to indirect gap transition strain is found to be at 2.7% in MoS$_2$ and 3.9% in WS$_2$. These values are generally higher than the previously reported theoretical values.
