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Controlling thin film formation is technologically challenging. The knowledge of physical properties of the film and of the atoms in the surface vicinity can help improve control over the film growth. We investigate the use of the well-established se lective reflection technique to probe the thin film during its growth, simultaneously monitoring the film thickness, the atom-surface van der Waals interaction and the vapor properties in the surface vicinity.
We report on a simple and robust technique to generate a dispersive signal which serves as an error signal to electronically stabilize a monomode cw laser emitting around an atomic resonance. We explore nonlinear effects in the laser beam propagation through a resonant vapor by way of spatial filtering. The performance of this technique is validated by locking semiconductor lasers to the cesium and rubidiumD2 line and observing long-term reduction of the emission frequency drifts, making the laser well adapted for many atomic physics applications.
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