Pt/Ti metallisation bilayers are used as bottom electrodes for ferroelectric thin films. During deposition of the ferroelectric films, these electrodes are exposed to elevated temperatures causing modifications of the Pt/Ti bottom electrode. Diffusio
n and oxidation of the Ti adhesion layer have been studied by the application of factor analysis to AES depth profile data and by RBS. Factor analysis was employed to extract the chemical information from the measured AES spectra and to derive semiquantitative depth profiles of the identified material compounds. RBS was used to obtain the quantitative depth distribution of the elements. By the combination of both methods, diffusion and oxidation processes were observed and could be precisely describe.
A new instrument for spot profile analysis of electron diffraction - SPA-LEED - has been set up. The instrument works either with a transparent phosphor screen for visual inspection of the pattern or in its main mode with a channeltron for the measur
ement of the intensity. The diffraction pattern is recorded with a fixed channeltron position by scanning the beam over the channeltron aperture using two sets of electrostatic deflection plates. The scanning range covers about 30{deg}. The intensity may vary over five orders of magnitude. The SPA-LEED system was checked with the Si 111 7 x 7 surface. A full width at half maximum of 0.3% of the normal reflex distance corresponding to a transfer width of 110 nm is reproducibly obtained. Under optimum conditions the transfer width rose up to about 200 nm. Initial high resolution measurements have been performed on the system Pb on Cu 111. The results demonstrate the possibilities of the new instrument for qualitative and quantitative analysis.
The outstanding design feature of an XPS microprobe Quantum 2000 is the double focussing ellipsoidally shaped quartz monochromator of the X-ray source. This device monochromatizes the Alk{alpha} radiation and refocuses the X-rays from the Al anode to
the sample surface. This way, on one hand a variation of the diameter of the X-ray generating electron beam allows to vary the X-ray beam diameter on the sample surface. On the other hand a scanning of the electron beam across the Al anode scans the X-ray beam across the sample surface. The X-ray source was characterized in detail. The lateral dependency of the primary X-ray intensity and the peaks FWHM were measured as function of the position within the electrostatically rasterable scan area. Additionally, the focussing quality of the monochromator was determined. Therefore the lateral intensity distribution within the primary X-ray beam was estimated far below the 1% intensity level.
