We predict that unpolarized charge current injected into a ballistic thin film of prototypical topological insulator (TI) Bi$_2$Se$_3$ will generate a {it noncollinear spin texture} $mathbf{S}(mathbf{r})$ on its surface. Furthermore, the nonequilibri
um spin texture will extend into $simeq 2$ nm thick layer below the TI surfaces due to penetration of evanescent wavefunctions from the metallic surfaces into the bulk of TI. Averaging $mathbf{S}(mathbf{r})$ over few AA{} along the longitudinal direction defined by the current flow reveals large component pointing in the transverse direction. In addition, we find an order of magnitude smaller out-of-plane component when the direction of injected current with respect to Bi and Se atoms probes the largest hexagonal warping of the Dirac-cone dispersion on TI surface. Our analysis is based on an extension of the nonequilibrium Green functions combined with density functional theory (NEGF+DFT) to situations involving noncollinear spins and spin-orbit coupling. We also demonstrate how DFT calculations with properly optimized local orbital basis set can precisely match putatively more accurate calculations with plane-wave basis set for the supercell of Bi$_2$Se$_3$.
We investigate the nature of electron transport through monolayer molybdenum dichalcogenides (MoX$_2$, X=S, Se) suspended between Au and Ti metallic contacts. The monolayer is placed ontop of the close-packed surfaces of the metal electrodes and we f
ocus on the role of the metal-MoX$_2$ binding distance and the contact area. Based on emph{ab initio} transport calculations we identify two different scattering mechanisms which depend differently on the metal-MoX$_2$ binding distance: (i) An interface resistance between the metal and the supported part of MoX$_2$ which decreases with decreasing binding distance and increasing contact area. (ii) An edge resistance across the 1D interface between metal-supported and free-standing MoX$_2$ which increases with decreasing binding distance and is independent on contact area. The origin of the edge resistance is a metal-induced potential shift within the MoX$_2$ layer. The optimal metal thus depends on the junction geometry. In the case of MoS$_2$, we find that for short contacts, L$<$6 nm, Ti electrodes (with short binding distance) gives the lowest resistance, while for longer contacts, Au (large binding distance) is a better electrode metal.
