How to transfer MoS2 films from growth substrates onto target substrates is a critical issue for its practical applications. However, it remains a great challenge to avoid the sample degradation and substrate destruction, since current transfer metho
d inevitably employs a wet chemical etching process. Herein, we develop an etching-free transfer method for transferring wafer-scale MoS2 films onto arbitrary substrates by using ultrasonication. Briefly, the collapse of ultrasonication-generated microbubbles at the interface between polymer-coated MoS2 film and substrates induce sufficient force to delaminate the MoS2 films. Using this method the MoS2 films can be transferred from all the substrates (silica, mica, strontium titanate, sapphire) and remains the original sample morphology and quality. This method guarantees a simple transfer process, allows the reuse of growth substrates, without the presence of any hazardous etchants. The etching-free transfer method may promote the broad applications of MoS2 in electronics, optoelectronics and catalysis.
We investigate the dynamical formation of excitons from photoexcited electron-hole plasma and its subsequent decay dynamics in monolayer MoS2 grown by chemical vapor deposition using ultrafast pump and terahertz probe spectroscopy. Different photoexc
ited electron-hole states are resolved based on their distinct responses to THz photon and decay lifetime. The observed transient THz transmission can be fit with two decay components: a fast component with decay lifetime of 20 ps, which is attributed to exciton life time including the exciton formation and subsequent intraexciton relaxation; a slow component with extremely long decay lifetime of several ns due to either localized exciton state or a long live dark exciton state which is uncovered for the first time. The relaxation dynamics is further verified by temperature and pump fluence dependent studies of the decay time constants.
