Using low energy electron diffraction (LEED), Auger electron spectroscopy (AES), scanning tunnelling microscopy (STM) and high resolution photo-electron spectroscopy (HR-PES) techniques we have studied the annealing effect of one silicon monolayer de
posited at room temperature onto a Ni (111) substrate. The variations of the Si surface concentration, recorded by AES at 300{deg}C and 400{deg}C, show at the beginning a rapid Si decreasing followed by a slowing down up to a plateau equivalent to about 1/3 silicon monolayer. STM images and LEED patterns, both recorded at room temperature just after annealing, reveal the formation of an ordered hexagonal superstructure(rot3xrot3)R30{deg}-type. From these observations and from a quantitative analysis of HR-PES data, recorded before and after annealing, we propose that the (rot3 x rot3)R30{deg}superstructure corresponds to a two dimensional (2D) Ni2Si surface silicide.
The effect of oxygen adsorption on the local structure and electronic properties of monolayer graphene grown on SiC(0001) has been studied by means of Low Energy Electron Microscopy (LEEM), microprobe Low Energy Electron Diffraction (muLEED) and micr
oprobe Angle Resolved Photoemission (muARPES). We show that the buffer layer of epitaxial graphene on SiC(0001) is partially decoupled after oxidation. The monitoring of the oxidation process demonstrates that the oxygen saturates the Si dangling bonds, breaks some Si-C bonds at the interface and intercalates the graphene layer. Accurate control over the oxidation parameters enables us to tune the charge density modulation in the layer.
