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Register a new userMgB2 tunnel junctions with native or thermal oxide barriers
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MgB2 tunnel junctions (MgB2/barrier/MgB2) were fabricated using a native oxide grown on the bottom MgB2 film as the tunnel barrier. Such barriers therefore survive the deposition of the second electrode at 300oC, even over junction areas of ~1 mm2. Studies of such junctions, and those of the type MgB2/native or thermal oxide/metal (Pb, Au, or Ag) show that tunnel barriers grown on MgB2 exhibit a wide range of barrier heights and widths.
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We present results on all-MgB2 tunnel junctions, where the tunnel barrier is deposited MgO or native-oxide of base electrode. For the junctions with MgO, the hysteretic I-V curve resembles a conventional underdamped Josephson junction characteristic with critical current-resistance product nearly independent of the junction area. The dependence of the critical current with temperature up to 20 K agrees with the [Ambegaokar and Baratoff, Phys. Rev. Lett. 10, 486 (1963)] expression. For the junctions with native-oxide, conductance at low bias exhibits subgap features while at high bias reveals thick barriers. As a result no supercurrent was observed in the latter, despite the presence of superconducting-gaps to over 30 K.
Josephson tunnel junctions with the strong ferromagnetic alloy $Fe_{0.75}Co_{0.25}$ as the barrier material were studied. The junctions were prepared with high quality down to a thickness range of a few monolayers of Fe-Co. An oscillation length of $xi_{F2}approx 0.79:{rm {nm}}$ between 0 and $pi$-Josephson phase coupling and a very short decay length $xi_{F1}approx 0.22:{rm {nm}}$ for the amplitude of the superconducting pair wave function in the Fe-Co layer were determined. The rapid damping of the pair wave function inside the Fe-Co layer is caused by the strong ferromagnetic exchange field and additional magnetic pair breaking scattering. Josephson junctions with Fe-Co barriers show a significantly increased tendency towards magnetic remanence and flux trapping for larger thicknesses $d_{F}$.
The dependence of the critical current density j_c on the ferromagnetic interlayer thickness d_F was determined for Nb/Al_2O_3/Cu/Ni/Nb Josephson tunnel junctions with ferromagnetic Ni interlayer from very thin film thicknesses (sim 1 nm) upwards and classified into F-layer thickness regimes showing a dead magnetic layer, exchange, exchange + anisotropy and total suppression of j_c. The Josephson coupling changes from 0 to pi as function of d_F, and -very close to the crossover thickness- as function of temperature. The strong suppression of the supercurrent in comparison to non-magnetic Nb/Al_2O_3/Cu/Nb junctions indicated that the insertion of a F-layer leads to additional interface scattering. The transport inside the dead magnetic layer was in dirty limit. For the magnetically active regime fitting with both the clean and the dirty limit theory were carried out, indicating dirty limit condition, too. The results were discussed in the framework of literature
We fabricated high quality Nb/Al_2O_3/Ni_{0.6}Cu_{0.4}/Nb superconductor-insulator-ferromagnet-superconductor Josephson tunnel junctions. Using a ferromagnetic layer with a step-like thickness, we obtain a 0-pi junction, with equal lengths and critical currents of 0 and pi parts. The ground state of our 330 microns (1.3 lambda_J) long junction corresponds to a spontaneous vortex of supercurrent pinned at the 0-pi step and carrying ~6.7% of the magnetic flux quantum Phi_0. The dependence of the critical current on the applied magnetic field shows a clear minimum in the vicinity of zero field.
Atomic Layer Deposition (ALD) is a promising technique for producing Josephson junctions (JJs) with lower defect densities for qubit applications. A key problem with using ALD for JJs is the interfacial layer (IL) that develops underneath the tunnel barrier. An IL up to 2 nm forms between ALD Al2O3 and Al. However, the IL thickness is unknown for ALD films less 1 nm. In this work, Nb-Al-ALD-Al2O3-Nb trilayers with tunnel barriers from 0.6 - 1.6 nm were grown in situ. Nb-Al-AlOx-Nb JJs with thermally oxidized tunnel barrier were produced for reference. RN was obtained using a four-point method at 300 K. JC, and its dependence on barrier thickness, was calculated from the Ambegaokar-Baratoff formula. The Al surface was modeled using ab initio molecular dynamics to study the nucleation of Al2O3 on Al. Current voltage characteristics were taken at 4 K to corroborate the room temperature measurements. Together, these results suggest that ALD may be used to grow an ultrathin, uniform tunnel barrier with controllable tunnel resistance and JC, but a thin IL develops during the nucleation stage of ALD growth that may disqualify Al as a suitable wetting layer for ALD JJ based qubits.
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