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Register a new userInter- and intra-band Coulomb interactions between holes in Silicon nanostructures
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We present a full derivation of the interaction Hamiltonian for holes in Silicon within the six-band envelope-function scheme, which appropriately describes the valence band close to the $boldsymbol{Gamma}$ point. The full structure of the single-hole eigenstates is taken into account, including the Bloch part, and the scattering processes caused by the Coulomb interaction are shown to be both intraband and interband; the interband terms are mostly short-ranged. In the asymptotic long-range limit, the effective potential tends to the screened Coulomb potential, and becomes purely intraband, as assumed in previous models. Our findings can be directly used for realistic exact-diagonalization calculations related to systems of interacting holes in Silicon nanostructures, such as quantum dots.
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We consider confinement of Dirac fermions in $AB$-stacked bilayer graphene by inhomogeneous on-site interactions, (pseudo-)magnetic field or inter-layer interaction. Working within the framework of four-band approximation, we focus on the systems where the stationary equation is reducible into two stationary equations with $2times2$ Dirac-type Hamiltonians and auxiliary interactions. We show that it is possible to find localized states by solving an effective Schrodinger equation with energy-dependent potential. We consider several scenarios where bilayer graphene is subject to inhomogneous (pseudo-)magnetic field, on-site interactions or inter-layer coupling. In explicit examples, we provide analytical solutions for the states localized by local fluctuations or periodicity defects of the interactions.
The presence of two spin-split valleys in monolayer (1L) transition metal dichalcogenide (TMD) semiconductors supports versatile exciton species classified by their spin and valley quantum numbers. While the spin-0 intravalley exciton, known as the bright exciton, is readily observable, other types of excitons, such as the spin-1 intravalley (spin-dark) and spin-0 intervalley (momentum-dark) excitons, are more difficult to access. Here we develop a waveguide coupled 1L tungsten diselenide (WSe2) device to probe these exciton species. In particular, TM coupling to the atomic layers out-of-plane dipole moments enabled us to not only efficiently collect, but also resonantly populate the spin-1 dark excitons, promising for developing devices with long valley lifetimes. Our work reveals several upconversion processes that bring out an intricate coupling network linking spin-0 and spin-1 intra- and inter-valley excitons, demonstrating that intervalley scattering and spin-flip are very common processes in the atomic layer. These experimental results deepen our understanding of tungsten diselenide exciton physics and illustrate that planar photonic devices are capable of harnessing versatile exciton species in TMD semiconductors.
Piezoresistance is the change in the electrical resistance, or more specifically the resistivity, of a solid induced by an applied mechanical stress. The origin of this effect in bulk, crystalline materials like Silicon, is principally a change in the electronic structure which leads to a modification of the charge carriers effective mass. The last few years have seen a rising interest in the piezoresistive properties of semiconductor nanostructures, motivated in large part by claims of a giant piezoresistance effect in Silicon nanowires that is more than two orders of magnitude bigger than the known bulk effect. This review aims to present the controversy surrounding claims and counter-claims of giant piezoresistance in Silicon nanostructures by presenting a summary of the major works carried out over the last 10 years. The main conclusions that can be drawn from the literature are that i) reproducible evidence for a giant piezoresistance effect in un-gated Silicon nanowires is limited, ii) in gated nanowires a giant effect has been reproduced by several authors, iii) the giant effect is fundamentally different from either the bulk Silicon piezoresistance or that due to quantum confinement in accumulation layers and heterostructures, the evidence pointing to an electrostatic origin for the piezoresistance, iv) released nanowires tend to have slightly larger piezoresistance coefficients than un-released nanowires, and v) insufficient work has been performed on bottom-up grown nanowires to be able to rule out a fundamental difference in their properties when compared with top-down nanowires. On the basis of this, future possible research directions are suggested.
Electrons confined in silicon quantum dots exhibit orbital, spin, and valley degrees of freedom. The valley degree of freedom originates from the bulk bandstructure of silicon, which has six degenerate electronic minima. The degeneracy can be lifted in silicon quantum wells due to strain and electronic confinement, but the valley splitting of the two lowest lying valleys is known to be sensitive to atomic-scale disorder. Large valley splittings are desirable to have a well-defined spin qubit. In addition, an understanding of the inter-valley tunnel coupling that couples different valleys in adjacent quantum dots is extremely important, as the resulting gaps in the energy level diagram may affect the fidelity of charge and spin transfer protocols in silicon quantum dot arrays. Here we use microwave spectroscopy to probe spatial variations in the valley splitting, and the intra- and inter-valley tunnel couplings ($t_{ij}$ and $t_{ij}$) that couple dots $i$ and $j$ in a triple quantum dot (TQD). We uncover large spatial variations in the ratio of inter-valley to intra-valley tunnel couplings $t_{12}/t_{12}=0.90$ and $t_{23}/t_{23}=0.56$. By tuning the interdot tunnel barrier we also show that $t_{ij}$ scales linearly with $t_{ij}$, as expected from theory. The results indicate strong interactions between different valley states on neighboring dots, which we attribute to local inhomogeneities in the silicon quantum well.
We present transport measurements on a tunable three-layer graphene single electron transistor (SET). The device consists of an etched three-layer graphene flake with two narrow constrictions separating the island from source and drain contacts. Three lateral graphene gates are used to electrostatically tune the device. An individual three-layer graphene constriction has been investigated separately showing a transport gap near the charge neutrality point. The graphene tunneling barriers show a strongly nonmonotonic coupling as function of gate voltage indicating the presence of localized states in the constrictions. We show Coulomb oscillations and Coulomb diamond measurements proving the functionality of the graphene SET. A charging energy of $approx 0.6$ meV is extracted.
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