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Register a new userZitterbewegung-mediated RKKY coupling in topological insulator thin films
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The dynamics of itinerant electrons in topological insulator (TI) thin films is investigated using a multi-band decomposition approach. We show that the electron trajectory in the 2D film is anisotropic and confined within a characteristic region. Remarkably, the confinement and anisotropy of the electron trajectory are associated with the topological phase transition of the TI system, which can be controlled by tuning the film thickness and/or applying an in-plane magnetic field. Moreover, persistent electron wavepacket oscillation can be achieved in the TI thin film system at the phase transition point, which may assist in the experimental detection of the jitter motion (Zitterbewegung). The implications of the microscopic picture of electron motion in explaining other transport-related effects, e.g., electron-mediated RKKY coupling in the TI thin film system, are also discussed.
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We consider the effective coupling between impurity spins on surfaces of a thin-film Weyl semimetal within Ruderman-Kittel-Kasuya-Yoshida (RKKY) theory. If the spins are on the same surface, their coupling reflects the anisotropy and the spin-momentum locking of the Fermi arcs. By contrast when the spins are on opposite surfaces, their coupling is mediated by the Fermi arcs as well as by bulk states. In this case the coupling is both surprisingly strong and strongly thickness dependent, with a maximum at an optimum thickness. We demonstrate our results using analytical solutions of states in the thin-film geometry, as well using a two-surface recursive Greens function analysis of the tight-binding model.
Thin films of topological insulators (TI) attract large attention because of expected topological effects from the inter-surface hybridization of Dirac points. However, these effects may be depleted by unexpectedly large energy smearing $Gamma$ of surface Dirac points by the random potential of abundant Coulomb impurities. We show that in a typical TI film with large dielectric constant $sim 50$ sandwiched between two low dielectric constant layers, the Rytova-Chaplik-Entin-Keldysh modification of the Coulomb potential of a charge impurity allows a larger number of the film impurities to contribute to $Gamma$. As a result, $Gamma$ is large and independent of the TI film thickness $d$ for $d > 5$ nm. In thinner films $Gamma$ grows with decreasing $d$ due to reduction of screening by the hybridization gap. We study the surface conductivity away from the neutrality point and at the neutrality point. In the latter case, we find the maximum TI film thickness at which the hybridization gap is still able to make a TI film insulating and allow observation of the quantum spin Hall effect, $d_{max} sim 7$ nm.
Axion insulator is an exotic magnetic topological insulator with zero Chern number but a nonzero quantized Chern-Simons magnetoelectric coupling. A conclusive experimental evidence for axion insulators is still lacking due to the small signal of topological magnetoelectric effect (TME). Here we show that the dynamical magnetoelectric coupling can be induced by the emph{out-of-plane} surface magnetization dynamics in axion insulator thin films, which further generates a polarization current in the presence of an external magnetic field in the same direction. Such a current is finite in the bulk and increases as the film thickness $d$ decreases, in opposite to TME current which decreases as $d$ decreases. Remarkably, the current in thin films at magnetic resonance is at least ten times larger than that of TME, and thus may serve as a smoking gun signature for axion insulators.
We report that the finite thickness of three-dimensional topological insulator (TI) thin films produces an observable magnetoresistance (MR) in phase coherent transport in parallel magnetic fields. The MR data of Bi2Se3 and (Bi,Sb)2Te3 thin films are compared with existing theoretical models of parallel field magnetotransport. We conclude that the TI thin films bring parallel field transport into a unique regime in which the coupling of surface states to bulk and to opposite surfaces is indispensable for understanding the observed MR. The {beta} parameter extracted from parallel field MR can in principle provide a figure of merit for searching TI compounds with more insulating bulk than existing materials.
Thin films of topological insulators (TI) usually exhibit multiple parallel conduction channels for the transport of electrical current. Beside the topologically protected surface states (TSS), parallel channels may exist, namely the interior of the not-ideally insulating TI film, the interface layer to the substrate, and the substrate itself. To be able to take advantage of the auspicious transport properties of the TSS, the influence of the parasitic parallel channels on the total current transport has to be minimized. Because the conductivity of the interior (bulk) of the thin TI film is difficult to access by measurements, we propose here an approach for calculating the mobile charge carrier concentration in the TI film. To this end, we calculate the near-surface band bending using parameters obtained experimentally from surface-sensitive measurements, namely (gate-dependent) four-point resistance measurements and angle-resolved photoelectron spectroscopy (ARPES). While in most cases another parameter in the calculations, i.e. the concentration of unintentional dopants inside the thin TI film, is unknown, it turns out that in the thin-film limit the band bending is largely independent of the dopant concentration in the film. Thus, a well-founded estimate of the total mobile charge carrier concentration and the conductivity of the interior of the thin TI film proves possible. Since the interface and substrate conductivities can be measured by a four-probe conductance measurement prior to the deposition of the TI film, the total contribution of all parasitic channels, and therefore also the contribution of the vitally important TSS, can be determined reliably.
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