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Register a new userQ factor limitation at short wavelength (around 300 nm) in III-nitride-on-silicon photonic crystal cavities
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Added by
Farsane Tabataba-Vakili
Publication date
2019
fields
Physics
and research's language is
English
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III-nitride-on-silicon L3 photonic crystal cavities with resonances down to 315 nm and quality factors (Q) up to 1085 at 337 nm have been demonstrated. The reduction of the quality factor with decreasing wavelength is investigated. Besides the quantum well absorption below 340 nm, a noteworthy contribution is attributed to the residual absorption present in thin AlN layers grown on silicon, as measured by spectroscopic ellipsometry. This residual absorption ultimately limits the Q factor to around 2000 at 300 nm when no active layer is present.
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Development of scalable quantum photonic technologies requires on-chip integration of components such as photonic crystal cavities and waveguides with nonclassical light sources. Recently, hexagonal boron nitride (hBN) has emerged as a promising platform for nanophotonics, following reports of hyperbolic phonon-polaritons and optically stable, ultra-bright quantum emitters. However, exploitation of hBN in scalable, on-chip nanophotonic circuits, quantum information processing and cavity quantum electrodynamics (QED) experiments requires robust techniques for the fabrication of monolithic optical resonators. In this letter, we design and engineer high quality photonic crystal cavities from hBN. We employ two approaches based on a focused ion beam method and a minimally-invasive electron beam induced etching (EBIE) technique to fabricate suspended two dimensional (2D) and one dimensional (1D) cavities with quality (Q) factors in excess of 2,000. Subsequently, we show deterministic, iterative tuning of individual cavities by direct-write, single-step EBIE without significant degradation of the Q-factor. The demonstration of tunable, high Q cavities made from hBN is an unprecedented advance in nanophotonics based on van der Waals materials. Our results and hBN processing methods open up promising new avenues for solid-state systems with applications in integrated quantum photonics, polaritonics and cavity QED experiments.
On-chip microlaser sources in the blue constitute an important building block for complex integrated photonic circuits on silicon. We have developed photonic circuits operating in the blue spectral range based on microdisks and bus waveguides in III-nitride on silicon. We report on the interplay between microdisk-waveguide coupling and its optical properties. We observe critical coupling and phase matching, i.e. the most efficient energy transfer scheme, for very short gap sizes and thin waveguides (g = 45 nm and w = 170 nm) in the spontaneous emission regime. Whispering gallery mode lasing is demonstrated for a wide range of parameters with a strong dependence of the threshold on the loaded quality factor. We show the dependence and high sensitivity of the output signal on the coupling. Lastly, we observe the impact of processing on the tuning of mode resonances due to the very short coupling distances. Such small footprint on-chip integrated microlasers providing maximum energy transfer into a photonic circuit have important potential applications for visible-light communication and lab-on-chip bio-sensors.
Ultraviolet microdisk lasers are integrated monolithically into photonic circuits using a III-nitride on silicon platform with gallium nitride (GaN) as the main waveguiding layer. The photonic circuits consist of a microdisk and a pulley waveguide terminated by out-coupling gratings. We measure quality factors up to 3500 under continuous-wave excitation. Lasing is observed from 374 nm to 399 nm under pulsed excitation, achieving low threshold energies of $0.14 ~text{mJ/cm}^2$ per pulse (threshold peak powers of $35 ~text{kW/cm}^2$). A large peak to background dynamic of around 200 is observed at the out-coupling grating for small gaps of 50 nm between the disk and waveguide. These devices operate at the limit of what can be achieved with GaN in terms of operation wavelength.
We investigate the design, fabrication and experimental characterization of high Quality factor photonic crystal nanobeam cavities in silicon. Using a five-hole tapered 1D photonic crystal mirror and precise control of the cavity length, we designed cavities with theoretical Quality factors as high as 14 million. By detecting the cross-polarized resonantly scattered light from a normally incident laser beam, we measure a Quality factor of nearly 750,000. The effect of cavity size on mode frequency and Quality factor was simulated and then verified experimentally.
Nanophotonic circuits using group III-nitrides on silicon are still lacking one key component: efficient electrical injection. In this paper we demonstrate an electrical injection scheme using a metal microbridge contact in thin III-nitride on silicon mushroom-type microrings that is compatible with integrated nanophotonic circuits with the goal of achieving electrically injected lasing. Using a central buried n-contact to bypass the insulating buffer layers, we are able to underetch the microring, which is essential for maintaining vertical confinement in a thin disk. We demonstrate direct current room-temperature electroluminescence with 440 mW/cm$^2$ output power density at 20 mA from such microrings with diameters of 30 to 50 $mu$m. The first steps towards achieving an integrated photonic circuit are demonstrated.
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