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Register a new userSingle layer MoS2 nanoribbon field effect transistor
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Added by
Dharmraj Kotekar-Patil
Publication date
2018
fields
Physics
and research's language is
English
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We study field effect transistor characteristics in etched single layer MoS2 nanoribbon devices of width 50nm with ohmic contacts. We employ a SF6 dry plasma process to etch MoS2 nanoribbons using low etching (RF) power allowing very good control over etching rate. Transconductance measurements reveal a steep sub-threshold slope of 3.5V/dec using a global backgate. Moreover, we measure a high current density of 38 uA/um resulting in high on/off ratio of the order of 10^5. We observe mobility reaching as high as 50 cm^2/V.s with increasing source-drain bias.
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We report on the fabrication and characterization of synthesized multiwall MoS2 nanotube (NT) and nanoribbon (NR) field-effect transistors (FETs). The MoS2 NTs and NRs were grown by chemical transport, using iodine as a transport agent. Raman spectroscopy confirms the material as unambiguously MoS2 in NT, NR, and flake forms. Transmission electron microscopy was used to observe cross sections of the devices after electrical measurements and these were used in the interpretation of the electrical measurements allowing estimation of the current density. The NT and NR FETs demonstrate n-type behavior, with ON/OFF current ratios exceeding 10^3, and with current densities of 1.02 {mu}A/{mu}m, and 0.79 {mu}A/{mu}m at VDS = 0.3 V and VBG = 1 V, respectively. Photocurrent measurements conducted on a MoS2 NT FET, revealed short-circuit photocurrent of tens of nanoamps under an excitation optical power of 78 {mu}W and 488 nm wavelength, which corresponds to a responsivity of 460 {mu}A/W. A long channel transistor model was used to model the common-source characteristics of MoS2 NT and NR FETs and was shown to be consistent with the measured data.
Here we repair the single-layer MoSe2 field-effect transistors by the EDTA processing, after which the devices room-temperature carrier mobility increases from 0.1 to over 70cm2/Vs. The atomic dynamics is constructed by the combined study of the first-principle calculation, aberration-corrected transmission electron microscopy and Raman spectroscopy. Single/double Se vacancies are revealed originally, which cause some mid-gap impurity states and localize the device carriers. They are found repaired with the result of improved electronic transport. Such a picture is confirmed by a 1.5cm-1 red shift in the Raman spectra.
We detect electroluminescence in single layer molybdenum disulphide (MoS2) field-effect transistors built on transparent glass substrates. By comparing absorption, photoluminescence, and electroluminescence of the same MoS2 layer, we find that they all involve the same excited state at 1.8eV. The electroluminescence has pronounced threshold behavior and is localized at the contacts. The results show that single layer MoS2, a direct band gap semiconductor, is promising for novel optoelectronic devices, such as 2-dimensional light detectors and emitters.
Here, we demonstrate the fabrication of single-layer MoS2 mechanical resonators. The fabricated resonators have fundamental resonance frequencies in the order of 10 MHz to 30 MHz (depending on their geometry) and their quality factor is about ~55 at room temperature in vacuum. The dynamical properties clearly indicate that monolayer MoS2 membranes are in the membrane limit (i.e., tension dominated), in contrast to their thicker counterparts, which behave as plates. We also demonstrate clear signatures of nonlinear behaviour of our atomically thin membranes, thus providing a starting point for future investigations on the nonlinear dynamics of monolayer nanomechanical resonators.
Atomically thin semiconductors have versatile future applications in the information and communication technologies for the ultimate miniaturization of electronic components. In particular, the ongoing research demands not only a large-scale synthesis of pristine quality monolayer MoS2 but also advanced nanofabrication and characterization methods for investigation of intrinsic device performances. Here, we conduct a meticulous investigation of the fast transient charge trapping mechanisms in field-effect transistors (FETs) of high-quality CVD MoS2 monolayers grown by a salt-driven method. To unfold the intrinsic transistor behavior, an amplitude sweep pulse I~V methodology is adapted with varying pulse widths. A significant increase in the field-effect mobility up to ~100% is achieved along with a hysteresis-free transfer characteristic by applying the shortest pulse. Moreover, to correlate these results, a single pulse time-domain drain current analysis is carried out to unleash the fast and slow transient charge trapping phenomena. Furthermore, rigorous density functional theory (DFT) calculations are implemented to inspect the effects of the Schottky barrier and metal-induced gap states between drain/source electrode and MoS2 for the superior carrier transport. Our findings on the controllable transient charge trapping mechanisms for estimation of intrinsic field-effect mobility and hysteresis-free transfer characteristic in salt-assisted CVD-grown MoS2 FETs will be beneficial for future device applications in complex memory, logic, and sensor systems.
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