We report simultaneous transport and scanning microwave impedance microscopy to examine the correlation between transport quantization and filling of the bulk Landau levels in the quantum Hall regime in gated graphene devices. Surprisingly, a comparison of these measurements reveals that quantized transport typically occurs below the complete filling of bulk Landau levels, when the bulk is still conductive. This result points to a revised understanding of transport quantization when carriers are accumulated by gating. We discuss the implications on transport study of the quantum Hall effect in graphene and related topological states in other two-dimensional electron systems.
Using graphene resonator, we perform electromechanical measurements in quantum Hall regime to probe the coupling between a quantum Hall (QH) system and its mechanical motion. Mechanically perturbing the QH state through resonance modifies the DC resistance of the system and results in a Fano-lineshape due to electronic interference. Magnetization of the system modifies the resonators equilibrium position and effective stiffness leading to changes in resonant frequency. Our experiments show that there is an intimate coupling between the quantum Hall state and mechanics - electron transport is affected by physical motion and in turn the magnetization modifies the electromechanical response.
We discuss transport through double gated single and few layer graphene devices. This kind of device configuration has been used to investigate the modulation of the energy band structure through the application of an external perpendicular electric field, a unique property of few layer graphene systems. Here we discuss technological details that are important for the fabrication of top gated structures, based on electron-gun evaporation of SiO$_2$. We perform a statistical study that demonstrates how --contrary to expectations-- the breakdown field of electron-gun evaporated thin SiO$_2$ films is comparable to that of thermally grown oxide layers. We find that a high breakdown field can be achieved in evaporated SiO$_2$ only if the oxide deposition is directly followed by the metallization of the top electrodes, without exposure to air of the SiO$_2$ layer.
The phenomenon of fractional quantum Hall effect (FQHE) was first experimentally observed 33 years ago. FQHE involves strong Coulomb interactions and correlations among the electrons, which leads to quasiparticles with fractional elementary charge. Three decades later, the field of FQHE is still active with new discoveries and new technical developments. A significant portion of attention in FQHE has been dedicated to filling factor 5/2 state, for its unusual even denominator and possible application in topological quantum computation. Traditionally FQHE has been observed in high mobility GaAs heterostructure, but new materials such as graphene also open up a new area for FQHE. This review focuses on recent progress of FQHE at 5/2 state and FQHE in graphene.
Low-dimensional electronic systems have traditionally been obtained by electrostatically confining electrons, either in heterostructures or in intrinsically nanoscale materials such as single molecules, nanowires, and graphene. Recently, a new paradigm has emerged with the advent of symmetry-protected surface states on the boundary of topological insulators, enabling the creation of electronic systems with novel properties. For example, time reversal symmetry (TRS) endows the massless charge carriers on the surface of a three-dimensional topological insulator with helicity, locking the orientation of their spin relative to their momentum. Weakly breaking this symmetry generates a gap on the surface, resulting in charge carriers with finite effective mass and exotic spin textures. Analogous manipulations of the one-dimensional boundary states of a two-dimensional topological insulator are also possible, but have yet to be observed in the leading candidate materials. Here, we demonstrate experimentally that charge neutral monolayer graphene displays a new type of quantum spin Hall (QSH) effect, previously thought to exist only in TRS topological insulators, when it is subjected to a very large magnetic field angled with respect to the graphene plane. Unlike in the TRS case, the QSH presented here is protected by a spin-rotation symmetry that emerges as electron spins in a half-filled Landau level are polarized by the large in-plane magnetic field. The properties of the resulting helical edge states can be modulated by balancing the applied field against an intrinsic antiferromagnetic instability, which tends to spontaneously break the spin-rotation symmetry. In the resulting canted antiferromagnetic (CAF) state, we observe transport signatures of gapped edge states, which constitute a new kind of one-dimensional electronic system with tunable band gap and associated spin-texture.
Composite fermions in fractional quantum Hall (FQH) systems are believed to form a Fermi sea of weakly interacting particles at half filling $ u=1/2$. Recently, it was proposed (D. T. Son, Phys. Rev. X 5, 031027 (2015)) that these composite fermions are Dirac particles. In our work, we demonstrate experimentally that composite fermions found in monolayer graphene are Dirac particles at half filling. Our experiments have addressed FQH states in high-mobility, suspended graphene Corbino disks in the vicinity of $ u=1/2$. We find strong temperature dependence of conductivity $sigma$ away from half filling, which is consistent with the expected electron-electron interaction induced gaps in the FQH state. At half filling, however, the temperature dependence of conductivity $sigma(T)$ becomes quite weak as expected for a Fermi sea of composite fermions and we find only logarithmic dependence of $sigma$ on $T$. The sign of this quantum correction coincides with weak antilocalization of composite fermions, which reveals the relativistic Dirac nature of composite fermions in graphene.
Yong-Tao Cui
,Bo Wen
,Eric Y. Ma
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(2015)
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"Unconventional Correlation between Quantum Hall Transport Quantization and Bulk State Filling in Gated Graphene Devices"
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Yong-Tao Cui
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