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Register a new userSuspended graphene devices with local gate control on an insulating substrate
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We present a fabrication process for graphene-based devices where a graphene monolayer is suspended above a local metallic gate placed in a trench. As an example we detail the fabrication steps of a graphene field-effect transistor. The devices are built on a bare high-resistivity silicon substrate. At temperatures of 77~K and below, we observe the field-effect modulation of the graphene resistivity by a voltage applied to the gate. This fabrication approach enables new experiments involving graphene-based superconducting qubits and nano-electromechanical resonators. The method is applicable to other two-dimensional materials.
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Herein we discuss the fabrication of ballistic suspended graphene nanostructures supplemented with local gating. Using in-situ current annealing, we show that exceptional high mobilities can be obtained in these devices. A detailed description is given of the fabrication of bottom and different top-gate structures, which enable the realization of complex graphene structures. We have studied the basic building block, the p-n junction in detail, where a striking oscillating pattern was observed, which can be traced back to Fabry-Perot oscillations that are localized in the electronic cavities formed by the local gates. Finally we show some examples how the method can be extended to incorporate multi-terminal junctions or shaped graphene. The structures discussed here enable the access to electron-optics experiments in ballistic graphene.
We measure spin transport in high mobility suspended graphene (mu ~ 10^5 cm^2/Vs), obtaining a (spin) diffusion coefficient of 0.1 m^2/s and giving a lower bound on the spin relaxation time (tau_s ~ 150 ps) and spin relaxation length (lambda_s=4.7 mu m) for intrinsic graphene. We develop a theoretical model considering the different graphene regions of our devices that explains our experimental data.
Electroluminescence from individual carbon nanotubes within split-gate devices is investigated. By characterizing the air-suspended nanotubes with photoluminescence spectroscopy, chirality is identified and electroluminescence peaks are assigned. We observe electroluminescence linewidth comparable to photoluminescence, indicating negligible heating and state-mixing effects. Split-gate and bias voltage dependences are consistent with emission from an electrostatically formed $pn$-junction.
Graphene (G) is a two-dimensional material with exceptional sensing properties. In general, graphene gas sensors are produced in field effect transistor configuration on several substrates. The role of the substrates on the sensor characteristics has not yet been entirely established. To provide further insight on the interaction between ammonia molecules (NH3) and graphene devices, we report experimental and theoretical studies of NH3 graphene sensors with graphene supported on three substrates: SiO2, talc and hexagonal boron nitride (hBN). Our results indicate that the charge transfer from NH3 to graphene depends not only on extrinsic parameters like temperature and gas concentration, but also on the average distance between the graphene sheet and the substrate. We find that the average distance between graphene and hBN crystals is the smallest among the three substrates, and that graphene-ammonia gas sensors based on a G/hBN heterostructure exhibit the fastest recovery times for NH3 exposure and are slightly affected by wet or dry air environment. Moreover, the dependence of graphene-ammonia sensors on different substrates indicates that graphene sensors exhibit two different adsorption processes for NH3 molecules: one at the top of the graphene surface and another at its bottom side close to the substrate. Therefore, our findings show that substrate engineering is crucial to the development of graphene-based gas sensors and indicate additional routes for faster sensors.
We fabricate planar all-graphene field-effect transistors with self-aligned side-gates at 100 nm from the main graphene conductive channel, using a single lithographic step. We demonstrate side-gating below 1V with conductance modulation of 35% and transconductance up to 0.5 mS/mm at 10 mV drain bias. We measure the planar leakage along the SiO2/vacuum gate dielectric over a wide voltage range, reporting rapidly growing current above 15 V. We unveil the microscopic mechanisms driving the leakage, as Frenkel-Poole transport through SiO2 up to the activation of Fowler-Nordheim tunneling in vacuum, which becomes dominant at high voltages. We report a field-emission current density as high as 1uA/um between graphene flakes. These findings are essential for the miniaturization of atomically thin devices.
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