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Register a new userAfterpulsing in Silicon Photomultipliers: Impact on the Photodetectors Characterization
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Adam Para
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Novel generation of silicon-based photodetectors are attractive alternatives to the traditional phototubes. They offer significant advantages but they present new challenges too. Presence of afterpulses may affect many characteristics of the photodetectors. Simple statistical model of afterpulsing is used to evaluate the contribution to the observed dark count rates, to examine the contribution to the pulse height resolution and to demonstrate the modification of the observed timing properties of the SiPMs.
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Silicon Photomultipliers (SiPMs) are attractive candidates for light detectors for next generation liquid xenon double-beta decay experiments, like nEXO. In this paper we discuss the requirements that the SiPMs must satisfy in order to be suitable for nEXO and similar experiments, describe the two test setups operated by the nEXO collaboration, and present the results of characterization of SiPMs from several vendors. In particular, we find that the photon detection efficiency at the peak of xenon scintillation light emission (175-178 nm) approaches the nEXO requirements for tested FBK and Hamamatsu devices. Additionally, the nEXO collaboration performed radioassay of several grams of bare FBK devices using neutron activation analysis, indicating levels of 40K, 232Th, and 238U of the order of <0.15, (6.9e10-4 - 1.3e10-2), and <0.11 mBq/kg, respectively.
We investigated the reset time of superconducting nanowire avalanche photodetectors (SNAPs) based on 30 nm wide nanowires. We studied the dependence of the reset time of SNAPs on the device inductance and discovered that SNAPs can provide a speed-up relative to SNSPDs with the same area, but with some limitations: (1) reducing the series inductance of SNAPs (necessary for the avalanche formation) could result in the detectors operating in an unstable regime; (2) a trade-off exists between maximizing the bias current margin and minimizing the reset time of SNAPs; and (3) reducing the reset time of SNAPs below ~ 1 ns resulted in afterpulsing.
Silicon photomultipliers (SiPMs) have a low radioactivity, compact geometry, low operation voltage, and reasonable photo-detection efficiency for vacuum ultraviolet light (VUV). Therefore it has the potential to replace photomultiplier tubes (PMTs) for future dark matter experiments with liquid xenon (LXe). However, SiPMs have nearly two orders of magnitude higher dark count rate (DCR) compared to that of PMTs at the LXe temperature ($sim$ 165 K). This type of high DCR mainly originates from the carriers that are generated by band-to-band tunneling effect. To suppress the tunneling effect, we have developed a new SiPM with lowered electric field strength in cooperation with Hamamatsu Photonics K. K. and characterized its performance in a temperature range of 153 K to 298 K. We demonstrated that the newly developed SiPMs had 6--54 times lower DCR at low temperatures compared to that of the conventional SiPMs.
This paper describes an experimental setup that has been developed to measure and characterise properties of Silicon Photomultipliers (SiPM). The measured SiPM properties are of general interest for a multitude of potential applications and comprise the Photon Detection Efficiency (PDE), the voltage dependent cross-talk and the after-pulse probabilities. With the described setup the absolute PDE can be determined as a function of wavelength covering a spectral range from 350 to 1000nm. In addition, a method is presented which allows to study the pixel uniformity in terms of the spatial variations of sensitivity and gain. The results from various commercially available SiPMs - three HAMAMATSU MPPCs and one SensL SPM - are presented and compared.
Reflectance of silicon photomultipliers (SiPMs) is an important aspect to understand the large scale SiPM-based detector systems and evaluate the performance of SiPMs. We report the reflactance of two SiPMs, NUV-HD-lowCT and S14160-60-50HS manufactured by Fondazione Bruno Kessler (FBK) and Hamamatsu Photonics K.K. (HPK) respectively, in linear alkylbenzene (LAB) and in air at visible wavelengths. Our results show that the reflectance of the FBK SiPM in air varies in the range of 14% to 23% , depending on wavelengths and angle of incidence, which is 2 time larger than that of the HPK device. This indicates that the two manufacturers are using different designs of anti-reflective coating on SiPMs surfaces. The reflectance is reduced by about 10% when SiPMs are immersed in LAB, compared with that measured in air. The profiles of reflected light beams are also measured by a charge-coupled device (CCD) camera for the two SiPMs.
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