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Register a new userEnhancement in the Figure of Merit of p-type BiSb alloys through multiple valence-band doping
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N-type Bi100-xSbx alloys have the highest thermoelectric figure of merit (zT) of all materials below 200K; here we investigate how filling multiple valence band pockets at T and H-points of the Brillouin zone produces high zT in p-type Sn-doped material. This approach, theoretically predicted to potentially give zT>1 in Bi, was used successfully in PbTe. We report thermopower, electrical and thermal conductivity (2 to 400K) of single crystals with 12<x<37 and polycrystals (x=50-90), higher Sb concentrations than previous studies. We obtain a 60% improvement in zT to 0.13.
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GeO$_2$ has an $alpha$-quartz-type crystal structure with a very wide fundamental band gap of 6.6 eV and is a good insulator. Here we find that the stable rutile-GeO$_2$ polymorph with a 4.6 eV band gap has a surprisingly low $sim$6.8 eV ionization potential, as predicted from the band alignment using first-principles calculations. Because of the short O$-$O distances in the rutile structure containing cations of small effective ionic radii such as Ge$^{4+}$, the antibonding interaction between O 2p orbitals raises the valence band maximum energy level to an extent that hole doping appears feasible. Experimentally, we report the flux growth of $1.5 times 1.0 times 0.8$ mm$^3$ large rutile GeO$_2$ single crystals and confirm the thermal stability for temperatures up to $1021 pm 10~^circ$C. X-ray fluorescence spectroscopy shows the inclusion of unintentional Mo impurities from the Li$_2$O$-$MoO$_3$ flux, as well as the solubility of Ga in the r-GeO$_2$ lattice as a prospective acceptor dopant. The resistance of the Ga- and Mo-codoped r-GeO$_2$ single crystals is very high at room temperature, but it decreases by 2-3 orders of magnitude upon heating to 300 $^circ$C, which is attributed to thermally-activated p-type conduction.
Half-Heusler alloys (MgAgSb structure) are promising thermoelectric materials. RNiSn half-Heusler phases (R=Hf, Zr, Ti) are the most studied in view of their thermal stability. The highest dimensionless figure of merit (ZT) obtained is ~1 in the temperature range ~450-900oC, primarily achieved in nanostructured alloys. Through proper annealing, ZT~1.2 has been obtained in a previous ZT~1 n-type (Hf,Zr)NiSn phase without the nanostructure. There is an appreciable increase in the power factor, decrease in charge carrier density, and increase in carrier mobility. The findings are attributed to the improvement of structural order. Present approach may be applied to optimize the functional properties of Heusler-type alloys.
Dimensionless thermoelectric figure of merit $ZT$ is investigated for two-dimensional organic conductors $tau-(EDO-S,S-DMEDT-TTF)_2(AuI_2)_{1+y}$, $tau$-(EDT-S,S-DMEDT-TTF)_2(AuI_2)_{1+y}$ and $tau$-(P-S,S-DMEDT-TTF)_2(AuI_2)_{1+y}$ ($y le 0.875$), respectively. The $ZT$ values were estimated by measuring electrical resistivity, thermopower and thermal conductivity simultaneously. The largest $ZT$ is 2.7 $times$ 10$^{-2}$ at 155 K for $tau-(EDT-S,S-DMEDT-TTF)_2(AuI_2)_{1+y}$, 1.5 $times$ 10$^{-2}$ at 180 K for $tau-(EDO-S,S-DMEDT-TTF)_2(AuI_2)_{1+y}$ and 5.4 $times$ 10$^{-3}$ at 78 K for $tau-(P-S,S-DMEDT-TTF)_2(AuI_2)_{1+y}$, respectively. Substitution of the donor molecules fixing the counter anion revealed EDT-S,S-DMEDT-TTF is the best of the three donors to obtain larger $ZT$.
The influence of periodic edge vacancies and antidot arrays on the thermoelectric properties of zigzag graphene nanoribbons is investigated. Using the Greens function method, the tight-binding approximation for the electron Hamiltonian and the 4th nearest neighbor approximation for the phonon dynamical matrix, we calculate the Seebeck coefficient and the thermoelectric figure of merit. It is found that, at a certain periodic arrangement of vacancies on both edges of zigzag nanoribbon, a finite band gap opens and almost twofold degenerate energy levels appear. As a result, a marked increase in the Seebeck coefficient takes place. It is shown that an additional enhancement of the thermoelectric figure of merit can be achieved by a combination of periodic edge defects with an antidot array.
Ge with a quasi-direct band gap can be realized by strain engineering, alloying with Sn, or ultrahigh n-type doping. In this work, we use all three approaches together to fabricate direct-band-gap Ge-Sn alloys. The heavily doped n-type Ge-Sn is realized with CMOS-compatible nonequilibrium material processing. P is used to form highly doped n-type Ge-Sn layers and to modify the lattice parameter of P-doped Ge-Sn alloys. The strain engineering in heavily-P-doped Ge-Sn films is confirmed by x-ray diffraction and micro Raman spectroscopy. The change of the band gap in P-doped Ge-Sn alloy as a function of P concentration is theoretically predicted by density functional theory and experimentally verified by near-infrared spectroscopic ellipsometry. According to the shift of the absorption edge, it is shown that for an electron concentration greater than 1x10^20 cm-3 the band-gap renormalization is partially compensated by the Burstein-Moss effect. These results indicate that Ge-based materials have high potential for use in near-infrared optoelectronic devices, fully compatible with CMOS technology.
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