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Phase Transition of the Uniaxial Disordered Ferroelectric Sr$_{0.61}$Ba$_{0.39}$Nb$_2$O$_6$

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 Publication date 2012
  fields Physics
and research's language is English




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We report a neutron scattering study of a ferroelectric phase transition in Sr$_{0.61}$Ba$_{0.39}$Nb$_2$O$_6$ (SBN-61). The ferroelectric polarization is along the crystallographic $c$-axis but the transverse acoustic branch propagating along the $<$1, 1, 0$>$ direction does not show any anomaly associated with the this transition. We find no evidence for a soft transverse optic phonon. We do, however, observe elastic diffuse scattering. The intensity of this scattering increases as the sample is cooled from a temperature well above the phase transition. The susceptibility associated with this diffuse scattering follows well the anomaly of the dielectric permittivity of SBN-61. Below T$_mathrm{c}$ the shape of this scattering is consistent with the scattering expected from ferroelectric domain walls. Our results suggest that despite apparent chemical disorder SBN-61 behaves as a classic order-disorder uniaxial ferroelectric with critical fluctuations in the range $<10^{-11}$ s.



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106 - Ziye Zhu , Xiaoping Yao , Shu Zhao 2021
We discover that, in the layered semiconductor Bi$_2$O$_2$Se, an incipient ferroelectric transition endows the material a surprisingly large dielectric permittivity, providing it with a robust protection against mobility degradation by extrinsic Coulomb scattering. Based on state-of-the-art first-principles calculations, we show that the low-temperature electron mobility of Bi$_2$O$_2$Se, taking into account both electron-phonon and ionized impurity scattering, can reach an unprecedented level of $10^5$ to $10^7$ cm$^2$V$^{-1}$s$^{-1}$ over a wide range of realistic doping levels. Moreover, a small elastic strain of 1.7% can drive Bi$_2$O$_2$Se toward the ferroelectric phase transition, which further induces a giant increase in the permittivity, enabling the strain-tuning of carrier mobility by orders of magnitude. These results open a new avenue for the discovery of high-mobility layered semiconductors via phase and dielectric engineering.
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