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Register a new userInvestigation of the thermal stability of Mg/Co periodic multilayers for EUV applications
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M.-H. Hu
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We present the results of the characterization of Mg/Co periodic multilayers and their thermal stability for the EUV range. The annealing study is performed up to a temperature of 400degree C. Images obtained by scanning transmission electron microscopy and electron energy loss spectroscopy clearly show the good quality of the multilayer structure. The measurements of the EUV reflectivity around 25 nm (~49 eV) indicate that the reflectivity decreases when the annealing temperature increases above 300degreeC. X-ray emission spectroscopy is performed to determine the chemical state of the Mg atoms within the Mg/Co multilayer. Nuclear magnetic resonance used to determine the chemical state of the Co atoms and scanning electron microscopy images of cross sections of the Mg/Co multilayers reveal changes in the morphology of the stack from an annealing temperature of 305degreee;C. This explains the observed reflectivity loss.
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We study the introduction of a third material, namely Zr, within a nanometric periodic Mg/Co structure designed to work as optical component in the extreme UV (EUV) spectral range. Mg/Co, Mg/Zr/Co, Mg/Co/Zr and Mg/Zr/Co/Zr multilayers are designed, then characterized in terms of structural quality and optical performances through X-ray and EUV reflectometry measurements respectively. For the Mg/Co/Zr structure, the reflectance value is equal to 50% at 25.1 nm and 45deg of grazing incidence and reaches 51.3% upon annealing at 200deg C. Measured EUV reflectivity values of tri-layered systems are discussed in terms of material order within a period and compared to the predictions of the theoretical model of Larruquert. Possible applications are pointed out.
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