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Absorption enhancement in amorphous silicon photonic crystals for thin film photovoltaic solar cells

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 Added by Ounsi El Daif
 Publication date 2009
  fields Physics
and research's language is English




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We report on very high enhancement of thin layers absorption through band-engineering of a photonic crystal structure. We realized amorphous silicon (aSi) photonic crystals, where slow light modes improve absorption efficiency. We show through simulation that an increase of the absorption by a factor of 1.5 is expected for a film of aSi. The proposal is then validated by an experimental demonstration, showing an important increase of the absorption of a layer of aSi over a spectral range of 0.32-0.76 microns.



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This paper presents the preliminary results of optical characterization using spectroscopic ellipsometry of wurtzite indium gallium nitride (InxGa1-xN) thin films with medium indium content (0.38<x<0.68) that were deposited on silicon dioxide using plasma-enhanced evaporation. A Kramers-Kronig consistent parametric analytical model using Gaussian oscillators to describe the absorption spectra has been developed to extract the real and imaginary components of the dielectric function ({epsilon}1, {epsilon}2) of InxGa1-xN films. Scanning electron microscope (SEM) images are presented to examine film microstructure and verify film thicknesses determined from ellipsometry modelling. This fitting procedure, model, and parameters can be employed in the future to extract physical parameters from ellipsometric data from other InxGa1-xN films.
Using a combination of quantum and classical computational approaches, we model the electronic structure in amorphous silicon in order gain understanding of the microscopic atomic configurations responsible for light induced degradation of solar cells. We demonstrate that regions of strained silicon bonds could be as important as dangling bonds for creating traps for charge carriers. Further, our results show that defects are preferentially formed when a region in the amorphous silicon contains a hole and a light-induced excitation. These results agree with the puzzling dependencies on temperature, time, and pressure observed experimentally.
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We study polarization independent improved light trapping in commercial thin film hydrogenated amorphous silicon (a-Si:H) solar photovoltaic cells using a three-dimensional silver array of multi-resonant nano-disk structures embedded in a silicon nitride anti-reflection coating (ARC) to enhance optical absorption in the intrinsic layer (i-a-Si:H) for the visible spectrum for any polarization angle. Predicted total optical enhancement (OE) in absorption in the i-a-Si:H for AM-1.5 solar spectrum is 18.51% as compared to the reference, and producing a 19.65% improvement in short-circuit current density (JSC) over 11.7 mA/cm2 for a reference cell. The JSC in the nano-disk patterned solar cell (NDPSC) was found to be higher than the commercial reference structure for any incident angle. The NDPSC has a multi-resonant optical response for the visible spectrum and the associated mechanism for OE in i-a-Si:H layer is excitation of Fabry-Perot resonance facilitated by surface plasmon resonances. The detrimental Staebler-Wronski effect (SWE) in a-Si:H solar cell can be minimized by the additional OE in the NDPSC and self-annealing of defect states by additional heat generation, thus likely improving the overall stabilized characteristics of a-Si:H solar cells.
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